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Title: Work Functions of the transition Metals and Metal Silicides

Work Functions of the transition Metals and Metal Silicides The work functions of polycrystalline metals are often used to systematize Schottky barrier height data for rectifying contacts to semiconductors. Rectifying contacts to silicon devices are predominantly formed using conductive metal silicides with work functions which are not as well characterized as metal work functions. The present work has two objectives. First, it classifies the transition metals using correlations between the metal work function and the atomic chemical potential. Second, the available data for metal silicides is collected and interpreted using an average charge transfer (ACT) model. The ACT model accounts for the electronic hardness of the component elements in addition to their chemical potentials. New trends in the behavior of silicide work functions are identified.
Authors:
Publication Date:
OSTI Identifier:3597
Report Number(s):SAND99-0391J
TRN: AH200112%%348
DOE Contract Number:AC04-94AL85000
Resource Type:Journal Article
Data Type:
Resource Relation:Journal Name: Journal of Applied Physics; Other Information: Submitted to Journal of Applied Physics; PBD: 15 Feb 1999
Research Org:Sandia National Labs., Albuquerque, NM (US); Sandia National Labs., Livermore, CA (US)
Sponsoring Org:US Department of Energy (US)
Country of Publication:United States
Language:English
Subject: 36 MATERIALS SCIENCE; 42 ENGINEERING; SCHOTTKY BARRIER DIODES; HARDNESS; SILICIDES; SILICON; TRANSITION ELEMENTS; WORK FUNCTIONS