Radial analysis of a C{sub 2}F{sub 6} inductively coupled plasma using optical emission spectroscopy and laser induced fluorescence
- Univ. of Michigan, Ann Arbor, MI (United States). Dept. of Nuclear Engineering and Radiological Sciences
- Sandia National Lab., Albuquerque, NM (United States)
A C{sub 2}F{sub 6} Discharge in a GEC rf Reference cell equipped with an inductively coupled source has been analyzed using laser induced fluorescence and spatially resolved optical emission spectroscopy. Experiments were conducted approximately 1 cm above the lower electrode for C{sub 2}F{sub 6} and C{sub 2}F{sub 6}/Ar discharges at pressures ranging from 5 mTorr to 20 mTorr and inductive electrode power ranging from 100 W to 300 W. A 30 W bias was placed on the bottom electrode for all experiments. A 6 inch bare silicon wafer was used to represent processing conditions. A quartz ring was clamped to the top electrode to provide discharge stability. Radial profiles of optical emission were obtained using a novel glow discharge tomography sensor and regularized inversion solver. The 488 nm SiF line and the 703 nm F line were profiled, as well as the 750.4 nm Ar line in the C2F6/Ar runs in order to conduct spatially resolved actinometry of fluorine. Spatially resolved ground state radical density profiles were measured by laser induced fluorescence. Results of the OES and LIF experiments are presented and compared.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- Sponsoring Organization:
- SEMATECH, Austin, TX (United States); National Science Foundation, Washington, DC (United States); USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 338540
- Report Number(s):
- CONF-980601-; TRN: IM9919%%156
- Resource Relation:
- Conference: 25. international conference on plasma science, Raleigh, NC (United States), 1-4 Jun 1998; Other Information: PBD: 1998; Related Information: Is Part Of IEEE conference record -- Abstracts. 1998 IEEE international conference on plasma science; PB: 343 p.
- Country of Publication:
- United States
- Language:
- English
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