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Title: Structural characterization of amorphized InP: Evidence for chemical disorder

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.123664· OSTI ID:328582
;  [1];  [2];  [3]; ; ;  [4]
  1. Department of Electronic Materials Engineering, Research School of Physical Sciences and Engineering, Australian National University, Canberra (Australia)
  2. Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)
  3. Australian Nuclear Science and Technology Organisation, Menai (Australia)
  4. School of Materials Science and Engineering, Seoul National University, Seoul (Korea)

Extended x-ray absorption fine-structure measurements at the In {ital K} edge of amorphous InP are presented. The presence of chemical disorder in the form of like-atom bonding has been unambiguously demonstrated in stoichiometric InP amorphized by ion implantation. In{endash}In bonding comprised 14{percent}{plus_minus}4{percent} of the In{endash}atom constituent bonds. Also, relative to the crystalline value of four P atoms, an increase in the total In coordination number to 4.16{plus_minus}0.32 atoms was observed for the amorphous phase, as composed of 3.56{plus_minus}0.19; P and 0.60{plus_minus}0.13; In atoms. Experimental results were consistent with recent {ital ab initio} structural calculations and, furthermore, demonstrated that amorphous InP is best described by a Polk-like continuous random network, containing both even- and odd-membered rings. {copyright} {ital 1999 American Institute of Physics.}

OSTI ID:
328582
Journal Information:
Applied Physics Letters, Vol. 74, Issue 12; Other Information: PBD: Mar 1999
Country of Publication:
United States
Language:
English