Sources of strain-measurement error in flag-based extensometry
- National Inst. of Standards and Technology, Gaithersburg, MD (United States). Materials Science and Engineering Lab.
This paper examines the sources of error in strain measurement using flag-based extensometry that uses either scanning laser or electrooptical extensometers. These errors fall into two groups: errors in measuring the true gauge length of the specimen, which arise from the method of attachment of the flags, and errors arising from unanticipated distortions of the specimen during testing. The sources of errors of the first type include gauge-length errors from nonparallel flags and uncertainties in the true attachment point of the flag. During the test, strain-measurement errors of the second type can arise from horizontal translation of non-parallel flags, flag rotation that is induced by slippage, and flag motion from bending of the gauge length. Proper care can minimize the effect of these potential errors, so that flag-based extensometry can give accurate strain measurement, if appropriate precautions are taken. Measurements on silicon nitride indicate that the strain measurements are accurate to better than 10%.
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 271674
- Journal Information:
- Journal of the American Ceramic Society, Vol. 79, Issue 6; Other Information: PBD: Jun 1996
- Country of Publication:
- United States
- Language:
- English
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