Upper limit on the formation of NO(X{sup 2}{Pi}{sub r}) in the reactions N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O({sup 3}P) and N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O{sub 2}(X{sup 3}{Sigma}{sup -}{sub g}) at 298 K

Thomas, J M; Kaufman, F

doi:10.1021/jp960164v

Title: Upper limit on the formation of NO(X{sup 2}{Pi}{sub r}) in the reactions N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O({sup 3}P) and N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O{sub 2}(X{sup 3}{Sigma}{sup -}{sub g}) at 298 K

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Abstract

The concentration of the product nitric oxide, [NO(X{sup 2}{Pi}{sub r})]{sub product}, formed in the title reactions is measured as a function of the vibrational energy distribution in the N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) for v` >= 6 in a rapidly pumped discharge-flow reactor at nearly 298 K and a total pressure of nearly 2 Torr using laser-excited fluorescence techniques. For the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}, v` >= 2) + O({sup 3}P) there is no [NO(X{sup 2}{Pi}{sub r})]{sub observed} detected above the noise in the background emission signal. Correcting this null measurement for competing reactions, the NO(X{sup 2}{Pi}{sub r}) + N({sup 4}S,{sup 2}D) product yield accounts for >=2% (signal-to-background noise = 1, 1{sigma}) of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v`)]{sub total}. For the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v` >= 6) + O({sup 3}P) the [NO(X{sup 2}{Pi}{sub r})]{sub observed} is seen to increase slightly relative to the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v` >= 2) + O({sup 3}P). Correcting the [NO(X{sup 2}{Pi}{sub r})]{sub observed} for competing reactions, the NO(X{sup 2}{Pi}{sub r}) + N({sup 4}S,{sup 2}D) product yield accounts for 5.7{+-}1.1% of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u})]{sub total} and as much as 57{+-}14% of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{submore »« less

Authors:

Thomas, J M; Kaufman, F ^[1]

Orion International Technologies, Hanscom AFB, MA (United States)

Publication Date:: Thu May 23 00:00:00 EDT 1996

OSTI Identifier:: 263207

Resource Type:: Journal Article

Journal Name:: Journal of Physical Chemistry

Additional Journal Information:: Journal Volume: 100; Journal Issue: 21; Other Information: PBD: 23 May 1996

Country of Publication:: United States

Language:: English

Subject:: 40 CHEMISTRY; 54 ENVIRONMENTAL SCIENCES; NITRIC OXIDE; SYNTHESIS; ABUNDANCE; NITROGEN; CHEMICAL REACTIONS; OXYGEN; EXCITED STATES; VIBRATIONAL STATES; MOLECULES; ATMOSPHERIC CHEMISTRY

Citation Formats


                    Thomas, J M, and Kaufman, F. Upper limit on the formation of NO(X{sup 2}{Pi}{sub r}) in the reactions N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O({sup 3}P) and N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O{sub 2}(X{sup 3}{Sigma}{sup -}{sub g}) at 298 K.  United States: N. p., 1996. 
        Web.  doi:10.1021/jp960164v.

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                    Thomas, J M, & Kaufman, F. Upper limit on the formation of NO(X{sup 2}{Pi}{sub r}) in the reactions N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O({sup 3}P) and N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O{sub 2}(X{sup 3}{Sigma}{sup -}{sub g}) at 298 K.  United States.  https://doi.org/10.1021/jp960164v

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                    Thomas, J M, and Kaufman, F. 1996.  
        "Upper limit on the formation of NO(X{sup 2}{Pi}{sub r}) in the reactions N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O({sup 3}P) and N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O{sub 2}(X{sup 3}{Sigma}{sup -}{sub g}) at 298 K".  United States.  https://doi.org/10.1021/jp960164v.

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@article{osti_263207,

  title        = {Upper limit on the formation of NO(X{sup 2}{Pi}{sub r}) in the reactions N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O({sup 3}P) and N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) + O{sub 2}(X{sup 3}{Sigma}{sup -}{sub g}) at 298 K},

  author       = {Thomas, J M and Kaufman, F},

  abstractNote = {The concentration of the product nitric oxide, [NO(X{sup 2}{Pi}{sub r})]{sub product}, formed in the title reactions is measured as a function of the vibrational energy distribution in the N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}) for v` >= 6 in a rapidly pumped discharge-flow reactor at nearly 298 K and a total pressure of nearly 2 Torr using laser-excited fluorescence techniques. For the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}, v` >= 2) + O({sup 3}P) there is no [NO(X{sup 2}{Pi}{sub r})]{sub observed} detected above the noise in the background emission signal. Correcting this null measurement for competing reactions, the NO(X{sup 2}{Pi}{sub r}) + N({sup 4}S,{sup 2}D) product yield accounts for >=2% (signal-to-background noise = 1, 1{sigma}) of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v`)]{sub total}. For the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v` >= 6) + O({sup 3}P) the [NO(X{sup 2}{Pi}{sub r})]{sub observed} is seen to increase slightly relative to the reaction N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u},v` >= 2) + O({sup 3}P). Correcting the [NO(X{sup 2}{Pi}{sub r})]{sub observed} for competing reactions, the NO(X{sup 2}{Pi}{sub r}) + N({sup 4}S,{sup 2}D) product yield accounts for 5.7{+-}1.1% of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u})]{sub total} and as much as 57{+-}14% of the [N{sub 2}(A{sup 3}{Sigma}{sup +}{sub u}, 3 >= v`>= 6)]. 65 refs., 3 figs., 4 tabs.},

  doi          = {10.1021/jp960164v},

  url          = {https://www.osti.gov/biblio/263207},
  journal      = {Journal of Physical Chemistry},
number       = 21,

  volume       = 100,

  place        = {United States},

  year         = {Thu May 23 00:00:00 EDT 1996},

  month        = {Thu May 23 00:00:00 EDT 1996}

}

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