Particle-free microchip processing
Patent
·
OSTI ID:242596
Method and apparatus for reducing particulate contamination in microchip processing are disclosed. The method and apparatus comprise means to reduce particle velocity toward the wafer before the particles can be deposited on the wafer surface. A reactor using electric fields to reduce particle velocity and prevent particulate contamination is disclosed. A reactor using a porous showerhead to reduce particle velocities and prevent particulate contamination is disclosed. 5 figs.
- Research Organization:
- AT&T
- DOE Contract Number:
- AC04-76DP00789
- Assignee:
- SNL; SCA: 426000; 320303; PA: EDB-96:094809; SN: 96001600398
- Patent Number(s):
- US 5,522,933/A/
- Application Number:
- PAN: 8-246,049
- OSTI ID:
- 242596
- Resource Relation:
- Other Information: PBD: 4 Jun 1996
- Country of Publication:
- United States
- Language:
- English
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