SciTech Connect

Title: Perpendicular giant magnetoresistance in a 0.4 {mu}m diameter multilayer sensor

Perpendicular giant magnetoresistance in a 0.4 {mu}m diameter multilayer sensor We have fabricated a novel GMR ML flux sensor that is designed to operate in the CPP mode. The GMR sensor is a 0.4 {mu}m diameter, 0.09 {mu}m high Cu-Co ML pedestal. The sensors are patterned using electron beam lithography. The Al{sub 2}O{sub 3}-TiC substrate is coated with a sputter deposited Al{sub 2}O{sub 3} film that is polished to <0.2 nm RMS roughness. Contact to the bottom of the GMR sensor is made by depositing the Cu-Co multilayers onto a smooth 0.45 {mu}m thick Mo-Si ML stack. The top contact is self-aligned to the GMR sensor. This is accomplished, in part, by CMP. The top and bottom contact layers are electrically isolated by a PECVD Si{sub 3}N{sub 4} film. The configuration of the contacts allows four point probe resistance measurements. The GMR response of these 0.4 {mu}m diameter sensors is 12%.
Authors: ;
Publication Date:
OSTI Identifier:226400
Report Number(s):UCRL-JC--123000; CONF-960425--7
ON: DE96009807; TRN: 96:002812
DOE Contract Number:W-7405-ENG-48
Resource Type:Conference
Data Type:
Resource Relation:Conference: 1996 IEEE international magnetics conference, Seattle, WA (United States), 9-12 Apr 1996; Other Information: PBD: 29 Feb 1996
Research Org:Lawrence Livermore National Lab., CA (United States)
Sponsoring Org:USDOE, Washington, DC (United States)
Country of Publication:United States
Language:English
Subject: 44 INSTRUMENTATION, INCLUDING NUCLEAR AND PARTICLE DETECTORS; MAGNETIC FLUX; MEASURING METHODS; MEASURING INSTRUMENTS; MAGNETORESISTANCE; LAYERS; FABRICATION