Fully CMOS-compatible titanium nitride nanoantennas

Naik, Gururaj V.; Baum, Brian K.; Dionne, Jennifer A.; Petach, Trevor A.; Goldhaber-Gordon, David

doi:10.1063/1.4941413

Title: Fully CMOS-compatible titanium nitride nanoantennas

Journal Article · Mon Feb 01 00:00:00 EST 2016 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4941413· OSTI ID:22489390

Naik, Gururaj V.; Baum, Brian K.; Dionne, Jennifer A. ^[1]; Petach, Trevor A.; Goldhaber-Gordon, David ^[2]

Department of Materials Science and Engineering, Stanford University, 496 Lomita Mall, Stanford, California 94305 (United States)
Department of Physics, Stanford University, 382 Via Pueblo Mall, Stanford, California 94305 (United States)

CMOS-compatible fabrication of plasmonic materials and devices will accelerate the development of integrated nanophotonics for information processing applications. Using low-temperature plasma-enhanced atomic layer deposition (PEALD), we develop a recipe for fully CMOS-compatible titanium nitride (TiN) that is plasmonic in the visible and near infrared. Films are grown on silicon, silicon dioxide, and epitaxially on magnesium oxide substrates. By optimizing the plasma exposure per growth cycle during PEALD, carbon and oxygen contamination are reduced, lowering undesirable loss. We use electron beam lithography to pattern TiN nanopillars with varying diameters on silicon in large-area arrays. In the first reported single-particle measurements on plasmonic TiN, we demonstrate size-tunable darkfield scattering spectroscopy in the visible and near infrared regimes. The optical properties of this CMOS-compatible material, combined with its high melting temperature and mechanical durability, comprise a step towards fully CMOS-integrated nanophotonic information processing.

Cite

Export

Save

OSTI ID:: 22489390

Journal Information:: Applied Physics Letters, Vol. 108, Issue 5; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951

Country of Publication:: United States

Language:: English

References (25)

Alternative Plasmonic Materials: Beyond Gold and Silver Naik, Gururaj V.; Shalaev, Vladimir M.; Boltasseva, Alexandra Advanced Materials, Vol. 25, Issue 24 https://doi.org/10.1002/adma.201205076	journal	May 2013
Refractory Plasmonics with Titanium Nitride: Broadband Metamaterial Absorber Li, Wei; Guler, Urcan; Kinsey, Nathaniel Advanced Materials, Vol. 26, Issue 47 https://doi.org/10.1002/adma.201401874	journal	October 2014
Searching for better plasmonic materials West, P. R.; Ishii, S.; Naik, G. V. Laser & Photonics Reviews, Vol. 4, Issue 6 https://doi.org/10.1002/lpor.200900055	journal	March 2010
Photo-thermal tumor ablation in mice using near infrared-absorbing nanoparticles O'Neal, D. Patrick; Hirsch, Leon R.; Halas, Naomi J. Cancer Letters, Vol. 209, Issue 2 https://doi.org/10.1016/j.canlet.2004.02.004	journal	June 2004
Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials Lee, Sang Woon; Choi, Byung Joon; Eom, Taeyong Coordination Chemistry Reviews, Vol. 257, Issue 23-24 https://doi.org/10.1016/j.ccr.2013.04.010	journal	December 2013
Investigations of titanium nitride as metal gate material, elaborated by metal organic atomic layer deposition using TDMAT and NH3 Fillot, F.; Morel, T.; Minoret, S. Microelectronic Engineering, Vol. 82, Issue 3-4 https://doi.org/10.1016/j.mee.2005.07.083	journal	December 2005
Atomic layer deposition of titanium nitride from TDMAT precursor Musschoot, J.; Xie, Q.; Deduytsche, D. Microelectronic Engineering, Vol. 86, Issue 1 https://doi.org/10.1016/j.mee.2008.09.036	journal	January 2009
Accurate Modeling of Dark-Field Scattering Spectra of Plasmonic Nanostructures Jiang, Liyong; Yin, Tingting; Dong, Zhaogang ACS Nano, Vol. 9, Issue 10 https://doi.org/10.1021/acsnano.5b03622	journal	September 2015
Local Heating with Lithographically Fabricated Plasmonic Titanium Nitride Nanoparticles Guler, Urcan; Ndukaife, Justus C.; Naik, Gururaj V. Nano Letters, Vol. 13, Issue 12 https://doi.org/10.1021/nl4033457	journal	November 2013
Aluminum for Plasmonics Knight, Mark W.; King, Nicholas S.; Liu, Lifei ACS Nano, Vol. 8, Issue 1 https://doi.org/10.1021/nn405495q	journal	December 2013
Biosensing with plasmonic nanosensors Anker, Jeffrey N.; Hall, W. Paige; Lyandres, Olga Nature Materials, Vol. 7, Issue 6 https://doi.org/10.1038/nmat2162	journal	June 2008
Singular characteristics and unique chemical bond activation mechanisms of photocatalytic reactions on plasmonic nanostructures Christopher, Phillip; Xin, Hongliang; Marimuthu, Andiappan Nature Materials, Vol. 11, Issue 12 https://doi.org/10.1038/nmat3454	journal	October 2012
Graphene plasmonics for tunable terahertz metamaterials Ju, Long; Geng, Baisong; Horng, Jason Nature Nanotechnology, Vol. 6, Issue 10 https://doi.org/10.1038/nnano.2011.146	journal	September 2011
Heat-assisted magnetic recording by a near-field transducer with efficient optical energy transfer Challener, W. A.; Peng, Chubing; Itagi, A. V. Nature Photonics, Vol. 3, Issue 4 https://doi.org/10.1038/nphoton.2009.26	journal	March 2009
In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition Langereis, E.; Heil, S. B. S.; van de Sanden, M. C. M. Journal of Applied Physics, Vol. 100, Issue 2 https://doi.org/10.1063/1.2214438	journal	July 2006
Epitaxial superlattices with titanium nitride as a plasmonic component for optical hyperbolic metamaterials Naik, G. V.; Saha, B.; Liu, J. Proceedings of the National Academy of Sciences, Vol. 111, Issue 21 https://doi.org/10.1073/pnas.1319446111	journal	May 2014
A review of the optical properties of alloys and intermetallics for plasmonics Blaber, M. G.; Arnold, M. D.; Ford, M. J. Journal of Physics: Condensed Matter, Vol. 22, Issue 14 https://doi.org/10.1088/0953-8984/22/14/143201	journal	March 2010
A high performance 1.8 V, 0.20 μm CMOS technology with copper metallization Venkatesan, S.; Gelatos, A. V.; Hisra, S. International Electron Devices Meeting. IEDM Technical Digest https://doi.org/10.1109/iedm.1997.650495	conference	January 1997
Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing Kim, H. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6 https://doi.org/10.1116/1.1622676	journal	January 2003
Low-Loss Plasmonic Metamaterials Boltasseva, A.; Atwater, H. A. Science, Vol. 331, Issue 6015, p. 290-291 https://doi.org/10.1126/science.1198258	journal	January 2011
Refractory Plasmonics Guler, U.; Boltasseva, A.; Shalaev, V. M. Science, Vol. 344, Issue 6181 https://doi.org/10.1126/science.1252722	journal	April 2014
Growth Kinetics and Oxidation Mechanism of ALD TiN Thin Films Monitored by In Situ Spectroscopic Ellipsometry Van Bui, H.; Groenland, A. W.; Aarnink, A. A. I. Journal of The Electrochemical Society, Vol. 158, Issue 3 https://doi.org/10.1149/1.3530090	journal	January 2011
Large-area fabrication of TiN nanoantenna arrays for refractory plasmonics in the mid-infrared by femtosecond direct laser writing and interference lithography [Invited] Bagheri, Shahin; Zgrabik, Christine M.; Gissibl, Timo Optical Materials Express, Vol. 5, Issue 11 https://doi.org/10.1364/ome.5.002625	journal	January 2015
Surface Free Energy of Alloy Nitride Coatings Deposited Using Closed Field Unbalanced Magnetron Sputter Ion Plating Sun, Chen-Cheng; Lee, Shih-Chin; Hwang, Wen-Chi MATERIALS TRANSACTIONS, Vol. 47, Issue 10 https://doi.org/10.2320/matertrans.47.2533	journal	January 2006
Searching for Better Plasmonic Materials West, Paul; Ishii, Satoshi; Naik, Gururaj arXiv https://doi.org/10.48550/arxiv.0911.2737	preprint	January 2009

Cited By (10)

Plasmon‐Enhanced Photoelectrochemical Water Splitting for Efficient Renewable Energy Storage Mascaretti, Luca; Dutta, Aveek; Kment, Štěpán Advanced Materials, Vol. 31, Issue 31 https://doi.org/10.1002/adma.201805513	journal	December 2018
Broadband Hot-Electron Collection for Solar Water Splitting with Plasmonic Titanium Nitride Naldoni, Alberto; Guler, Urcan; Wang, Zhuoxian Advanced Optical Materials, Vol. 5, Issue 15 https://doi.org/10.1002/adom.201601031	journal	March 2017
Large-Area Ultrabroadband Absorber for Solar Thermophotovoltaics Based on 3D Titanium Nitride Nanopillars Chirumamilla, Manohar; Chirumamilla, Anisha; Yang, Yuanqing Advanced Optical Materials, Vol. 5, Issue 22 https://doi.org/10.1002/adom.201700552	journal	September 2017
Strontium Niobate for Near‐Infrared Plasmonics Dutta, Aveek; Wan, Dongyang; Yan, Bixing Advanced Optical Materials, Vol. 7, Issue 19 https://doi.org/10.1002/adom.201900401	journal	July 2019
Tunable plasmonic HfN nanoparticles and arrays Askes, Sven H. C.; Schilder, Nick J.; Zoethout, Erwin Nanoscale, Vol. 11, Issue 42 https://doi.org/10.1039/c9nr07683b	journal	January 2019
Temperature-dependent optical properties of titanium nitride Briggs, Justin A.; Naik, Gururaj V.; Zhao, Yang Applied Physics Letters, Vol. 110, Issue 10 https://doi.org/10.1063/1.4977840	journal	March 2017
Chiro-plasmonic refractory metamaterial with titanium nitride (TiN) core–shell nanohelices Venkataramanababu, Sruthi; Nair, Greshma; Deshpande, Preeti Nanotechnology, Vol. 29, Issue 25 https://doi.org/10.1088/1361-6528/aabb4a	journal	April 2018
Wrinkled titanium nitride nanocomposite for robust bendable electrodes Gence, L.; Escalona, M.; Castillo, C. Nanotechnology, Vol. 30, Issue 49 https://doi.org/10.1088/1361-6528/ab416c	journal	September 2019
Characterization of CMOS metal based dielectric loaded surface plasmon waveguides at telecom wavelengths Weeber, J. -C.; Arocas, J.; Heintz, O. Optics Express, Vol. 25, Issue 1 https://doi.org/10.1364/oe.25.000394	journal	January 2017
Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering Chang, Chun-Chieh; Nogan, John; Yang, Zu-Po Scientific Reports, Vol. 9, Issue 1 https://doi.org/10.1038/s41598-019-51236-3	journal	October 2019

Similar Records

Fully CMOS-compatible titanium nitride nanoantennas

Journal Article · Fri Feb 05 00:00:00 EST 2016 · Applied Physics Letters · OSTI ID:22489390

Briggs, Justin A.; Naik, Gururaj V.; Petach, Trevor A.; +3 more

Temperature-dependent optical properties of titanium nitride

Journal Article · Mon Mar 06 00:00:00 EST 2017 · Applied Physics Letters · OSTI ID:22489390

Briggs, Justin A.; Naik, Gururaj V.; Zhao, Yang; +5 more

3D Hybrid Plasmonic Framework with Au Nanopillars Embedded in Nitride Multilayers Integrated on Si

Journal Article · Tue Jun 23 00:00:00 EDT 2020 · Advanced Materials Interfaces · OSTI ID:22489390

Huang, Jijie; Wang, Xuejing; Li, Dongfang; +8 more

Related Subjects

36 MATERIALS SCIENCE
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CARBON
ELECTRON BEAMS
EPITAXY
FABRICATION
HARDNESS
INFORMATION
MAGNESIUM OXIDES
MELTING POINTS
OPTICAL PROPERTIES
OXYGEN
PLASMA
PROCESSING
SCATTERING
SERVICE LIFE
SILICON
SILICON OXIDES
SPECTROSCOPY
TITANIUM NITRIDES
WEAR RESISTANCE

Title: Fully CMOS-compatible titanium nitride nanoantennas

Citation Formats

References (25)

Cited By (10)

Similar Records

Related Subjects