Suppressed grain-boundary scattering in atomic layer deposited Nb:TiO{sub 2} thin films

Journal Article · Mon Nov 09 00:00:00 EST 2015 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4935425· OSTI ID:22486047

Niemelä, Janne-Petteri; Karppinen, Maarit ^[1]; Hirose, Yasushi; Hasegawa, Tetsuya ^[2]; Shigematsu, Kei ^[3]; Sano, Masahito ^[2]

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1. Department of Chemistry, Aalto University, FI-00076 Aalto (Finland)
2. Department of Chemistry, The University of Tokyo, Tokyo 113-0033 (Japan)
3. Kanagawa Academy of Science and Technology, Kawasaki 213-0012 (Japan)

We have fabricated high-quality thin films of the transparent conducting anatase Nb:TiO{sub 2} on glass substrates through atomic layer deposition, and a subsequent reductive heat treatment of the as-deposited amorphous films. Hall-effect measurements and Drude-fitting of the Vis-NIR spectra indicate that for lightly doped films deposited at temperatures around 170 °C, grain boundary scattering becomes negligible and the mobility is predominately limited by phonon-electron scattering inherent to the anatase lattice and by impurities. Simultaneously, such lighter doping leads to reduced plasma absorption, thereby improving material's performance as a transparent conductor.

• OSTI ID: 22486047
• Journal Information: Applied Physics Letters, Vol. 107, Issue 19; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ABSORPTION
DEPOSITION
DOPED MATERIALS
GLASS
GRAIN BOUNDARIES
HALL EFFECT
HEAT TREATMENTS
IMPURITIES
MOBILITY
PLASMA
SCATTERING
SUBSTRATES
THIN FILMS
TITANIUM OXIDES