Note: Ion-induced secondary electron emission from oxidized metal surfaces measured in a particle beam reactor
- Research Group Reactive Plasmas, Ruhr-University Bochum, 44801 Bochum (Germany)
- Technical and Macromolecular Chemistry, Paderborn University, 33098 Paderborn (Germany)
The secondary electron emission of metals induced by slow ions is characterized in a beam chamber by means of two coaxial semi-cylindrical electrodes with different apertures. The voltages of the outer electrode (screening), inner electrode (collector), and sample holder (target) were set independently in order to measure the effective yield of potential and kinetic electron emissions during ion bombardment. Aluminum samples were exposed to quantified beams of argon ions up to 2000 eV and to oxygen atoms and molecules in order to mimic the plasma-surface interactions on metallic targets during reactive sputtering. The variation of electron emission yield was correlated to the ion energy and to the oxidation state of Al surfaces. This system provides reliable measurements of the electron yields in real time and is of great utility to explore the fundamental surface processes during target poisoning occurring in reactive magnetron sputtering applications.
- OSTI ID:
- 22482583
- Journal Information:
- Review of Scientific Instruments, Vol. 86, Issue 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
Similar Records
Understanding the discharge voltage behavior during reactive sputtering of oxides
Negative ion effects during magnetron and ion beam sputtering of YBa/sub 2/Cu/sub 3/O/sub x/