A one-dimensional ion beam figuring system for x-ray mirror fabrication

Journal Article · Thu Oct 15 00:00:00 EDT 2015 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4934806· OSTI ID:22482581

Idir, Mourad; Huang, Lei; Bouet, Nathalie; Kaznatcheev, Konstantine; Vescovi, Matthew; Lauer, Ken ^[1]; Conley, Ray ^[2]; Rennie, Kent; Kahn, Jim; Nethery, Richard ^[3]; Zhou, Lin ^[4]

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1. NSLS-II, Brookhaven National Laboratory, P.O. Box 5000, Upton, New York 11973 (United States)
2. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
3. Kaufman & Robinson, Inc., 1330 Blue Spruce Drive, Fort Collins, Colorado 80524 (United States)
4. College of Mechatronics and Automation, National University of Defense Technology, 109 Deya Road, Changsha, Hunan 410073 (China)

We report on the development of a one-dimensional Ion Beam Figuring (IBF) system for x-ray mirror polishing. Ion beam figuring provides a highly deterministic method for the final precision figuring of optical components with advantages over conventional methods. The system is based on a state of the art sputtering deposition system outfitted with a gridded radio frequency inductive coupled plasma ion beam source equipped with ion optics and dedicated slit developed specifically for this application. The production of an IBF system able to produce an elongated removal function rather than circular is presented in this paper, where we describe in detail the technical aspect and present the first obtained results.

• OSTI ID: 22482581
• Journal Information: Review of Scientific Instruments, Vol. 86, Issue 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ACCURACY
DEPOSITION
FABRICATION
ION BEAMS
MIRRORS
POLISHING
RADIOWAVE RADIATION
SPUTTERING
X RADIATION