skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Spectroscopic investigations of band offsets of MgO|Al{sub x}Ga{sub 1-x}N epitaxial heterostructures with varying AlN content

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4930309· OSTI ID:22482033

Epitaxial (111) MgO films were prepared on (0001) Al{sub x}Ga{sub 1−x}N via molecular-beam epitaxy for x = 0 to x = 0.67. Valence band offsets of MgO to Al{sub x}Ga{sub 1−x}N were measured using X-ray photoelectron spectroscopy as 1.65 ± 0.07 eV, 1.36 ± 0.05 eV, and 1.05 ± 0.09 eV for x = 0, 0.28, and 0.67, respectively. This yielded conduction band offsets of 2.75 eV, 2.39 eV, and 1.63 eV for x = 0, 0.28, and 0.67, respectively. All band offsets measured between MgO and Al{sub x}Ga{sub 1−x}N provide a > 1 eV barrier height to the semiconductor.

OSTI ID:
22482033
Journal Information:
Applied Physics Letters, Vol. 107, Issue 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English

Cited By (4)

Ultrawide-Bandgap Semiconductors: Research Opportunities and Challenges journal December 2017
Energy band offsets of dielectrics on InGaZnO 4 journal June 2017
Nitride surface chemistry influence on band offsets at epitaxial oxide/GaN interfaces journal February 2018
Band alignments of sputtered dielectrics on GaN journal December 2019