Experimental evidence of warm electron populations in magnetron sputtering plasmas
Journal Article
·
· Journal of Applied Physics
- NU-SKKU Joint Institute Plasma-Nano Materials (IPNM), Center for Advance Plasma Surface Technology (CAPST), School of Materials Science and Engineering, Sungkyunkwan University, Suwon (Korea, Republic of)
- Plama Nanotechnology Research Center, Nagoya University, Nagoya (Japan)
This work report on the results obtained using the Langmuir probe (LP) measurements in high-power dc magnetron sputtering discharges. Data show clear evidence of two electron components, such as warm and bulk electrons, in the sputtering plasma in a magnetic trap. We have also used optical emission spectroscopy diagnostic method along with LP to investigate the plasma production. Data show that there is a presence of low-frequency oscillations in the 2–3 MHz range, which are expected to be generated by high-frequency waves. Analysis also suggests that the warm electrons, in the plasmas, can be formed due to the collisionless Landau damping of the bulk electrons.
- OSTI ID:
- 22412952
- Journal Information:
- Journal of Applied Physics, Vol. 117, Issue 3; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Effect of oxygen on the characteristics of radio frequency planar magnetron sputtering plasma used for aluminum oxide deposition
Ion-energy distributions at a substrate in reactive magnetron sputtering discharges in Ar/H{sub 2}S from copper, indium, and tungsten targets
Measurement of energy transfer at an isolated substrate in a pulsed dc magnetron discharge
Journal Article
·
Sun Apr 15 00:00:00 EDT 2007
· Journal of Applied Physics
·
OSTI ID:22412952
+1 more
Ion-energy distributions at a substrate in reactive magnetron sputtering discharges in Ar/H{sub 2}S from copper, indium, and tungsten targets
Journal Article
·
Sun Mar 01 00:00:00 EST 2009
· Journal of Applied Physics
·
OSTI ID:22412952
Measurement of energy transfer at an isolated substrate in a pulsed dc magnetron discharge
Journal Article
·
Sat Sep 15 00:00:00 EDT 2007
· Journal of Applied Physics
·
OSTI ID:22412952
+1 more