Ultra-high mobility two-dimensional electron gas in a SiGe/Si/SiGe quantum well
- Institute of Solid State Physics, Chernogolovka, Moscow District 142432 (Russian Federation)
- Physics Department, Northeastern University, Boston, Massachusetts 02115 (United States)
We report the observation of an electron gas in a SiGe/Si/SiGe quantum well with maximum mobility up to 240 m{sup 2}/Vs, which is noticeably higher than previously reported results in silicon-based structures. Using SiO, rather than Al{sub 2}O{sub 3}, as an insulator, we obtain strongly reduced threshold voltages close to zero. In addition to the predominantly small-angle scattering well known in the high-mobility heterostructures, the observed linear temperature dependence of the conductivity reveals the presence of a short-range random potential.
- OSTI ID:
- 22412752
- Journal Information:
- Applied Physics Letters, Vol. 106, Issue 9; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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