Exploring the wake of a dust particle by a continuously approaching test grain
- IEAP, Christian-Albrechts-Universität, D-24098 Kiel (Germany)
- ABB Switzerland Ltd., CH-5405 Baden-Daettwil (Switzerland)
The structure of the ion wake behind a dust particle in the plasma sheath of an rf discharge is studied in a two-particle system. The wake formation leads to attractive forces between the negatively charged dust and can cause a reduction of the charge of a particle. By evaluating the dynamic response of the particle system to small external perturbations, these quantities can be measured. Plasma inherent etching processes are used to achieve a continuous mass loss and hence an increasing levitation height of the lower particle, so that the structure of the wake of the upper particle, which is nearly unaffected by etching, can be probed. The results show a significant modification of the wake structure in the plasma sheath to one long potential tail.
- OSTI ID:
- 22410360
- Journal Information:
- Physics of Plasmas, Vol. 22, Issue 5; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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