Growth and oxidization stability of cubic Zr{sub 1−x}Gd{sub x}N solid solution thin films

Journal Article · Thu May 21 00:00:00 EDT 2015 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4921167· OSTI ID:22410228

Höglund, C. ^[1]; Alling, B. ^[2]; Jensen, J.; Hultman, L.; Birch, J. ^[2]; Hall-Wilton, R. ^[1]

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1. European Spallation Source ESS AB, P.O. Box 176, SE-221 00 Lund (Sweden)
2. Department of Physics, Chemistry and Biology (IFM), Thin Film Physics Division, Linköping University, SE-581 83 Linköping (Sweden)

We report Zr{sub 1−x}Gd{sub x}N thin films deposited by magnetron sputter deposition. We show a solid solubility of the highly neutron absorbing GdN into ZrN along the whole compositional range, which is in excellent agreement with our recent predictions by first-principles calculations. An oxidization study in air shows that Zr{sub 1−x}Gd{sub x}N with x reaching from 1 to close to 0 fully oxidizes, but that the oxidization is slowed down by an increased amount of ZrN or stopped by applying a capping layer of ZrN. The crystalline quality of Zr{sub 0.5}Gd{sub 0.5}N films increases with substrate temperatures increasing from 100 °C to 900 °C.

• OSTI ID: 22410228
• Journal Information: Journal of Applied Physics, Vol. 117, Issue 19; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CONCENTRATION RATIO
CUBIC LATTICES
DEPOSITION
GADOLINIUM NITRIDES
LAYERS
SOLID SOLUTIONS
SOLIDS
SOLUBILITY
SPUTTERING
SUBSTRATES
TEMPERATURE DEPENDENCE
THIN FILMS
ZIRCONIUM NITRIDES