Erratum: “Magnetization dynamics and interface studies in ion-beam sputtered Si/CoFeB (8)/MgO (4)/CoFeB (8)/Ta (5) structures” [J. Appl. Phys. 115, 17D127 (2014)]
Journal Article
·
· Journal of Applied Physics
- Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016 (India)
No abstract prepared.
- OSTI ID:
- 22402833
- Journal Information:
- Journal of Applied Physics, Vol. 116, Issue 23; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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