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Title: Erratum: “Magnetization dynamics and interface studies in ion-beam sputtered Si/CoFeB (8)/MgO (4)/CoFeB (8)/Ta (5) structures” [J. Appl. Phys. 115, 17D127 (2014)]

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4904921· OSTI ID:22402833
; ; ;  [1]
  1. Thin Film Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi 110016 (India)

No abstract prepared.

OSTI ID:
22402833
Journal Information:
Journal of Applied Physics, Vol. 116, Issue 23; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English