High average power, highly brilliant laser-produced plasma source for soft X-ray spectroscopy

Journal Article · Sun Mar 15 00:00:00 EDT 2015 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4916193· OSTI ID:22392434

Mantouvalou, Ioanna; Grötzsch, Daniel; Neitzel, Michael; Günther, Sabrina; Baumann, Jonas; Kanngießer, Birgit ^[1]; Witte, Katharina ^[1]; Jung, Robert; Stiel, Holger; Sandner, Wolfgang ^[2]

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1. Institute for Optics and Atomic Physics, Technical University of Berlin, 10623 Berlin (Germany)
2. Max-Born-Institute, 12489 Berlin (Germany)

In this work, a novel laser-produced plasma source is presented which delivers pulsed broadband soft X-radiation in the range between 100 and 1200 eV. The source was designed in view of long operating hours, high stability, and cost effectiveness. It relies on a rotating and translating metal target and achieves high stability through an on-line monitoring device using a four quadrant extreme ultraviolet diode in a pinhole camera arrangement. The source can be operated with three different laser pulse durations and various target materials and is equipped with two beamlines for simultaneous experiments. Characterization measurements are presented with special emphasis on the source position and emission stability of the source. As a first application, a near edge X-ray absorption fine structure measurement on a thin polyimide foil shows the potential of the source for soft X-ray spectroscopy.

• OSTI ID: 22392434
• Journal Information: Review of Scientific Instruments, Vol. 86, Issue 3; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ABSORPTION
EV RANGE
EXTREME ULTRAVIOLET RADIATION
FINE STRUCTURE
LASER-PRODUCED PLASMA
METALS
MONITORING
SOFT X RADIATION
SPECTROSCOPY
STABILITY