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Title: Atmospheric pressure plasma enhanced spatial ALD of silver

Abstract

The authors have investigated the growth of thin silver films using a unique combination of atmospheric process elements: spatial atomic layer deposition and an atmospheric pressure surface dielectric barrier discharge plasma source. Silver films were grown on top of Si substrates with good purity as revealed by resistivity values as low as 18 μΩ cm and C- and F-levels below detection limits of energy dispersive x-ray analysis. The growth of the silver films starts through the nucleation of islands that subsequently coalesce. The authors show that the surface island morphology is dependent on surface diffusion, which can be controlled by temperature within the deposition temperature range of 100–120 °C.

Authors:
; ; ;  [1];  [2];  [3];  [4]
  1. Holst Centre/TNO, High Tech Campus 31, 5656 AE Eindhoven (Netherlands)
  2. TNO, High Tech Campus 21, 5656 AE Eindhoven (Netherlands)
  3. TNO, Rondom 1, 5612 AP Eindhoven, The Netherlands and DWI Leibniz-Institut für Interaktive Materialien, Aachen (Germany)
  4. TNO, High Tech Campus 21, 5656 AE Eindhoven, The Netherlands and Department of Applied Physics, Eindhoven University of Technology, 5600 MB Eindhoven (Netherlands)
Publication Date:
OSTI Identifier:
22392104
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 33; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 42 ENGINEERING; ATMOSPHERIC PRESSURE; DEPOSITION; DIELECTRIC MATERIALS; FILMS; PLASMA; SILVER; SUBSTRATES; SURFACES; TEMPERATURE RANGE 0273-0400 K; X RADIATION

Citation Formats

Bruele, Fieke J. van den,, Smets, Mireille, Illiberi, Andrea, Poodt, Paul, Creyghton, Yves, Buskens, Pascal, and Roozeboom, Fred. Atmospheric pressure plasma enhanced spatial ALD of silver. United States: N. p., 2015. Web. doi:10.1116/1.4902561.
Bruele, Fieke J. van den,, Smets, Mireille, Illiberi, Andrea, Poodt, Paul, Creyghton, Yves, Buskens, Pascal, & Roozeboom, Fred. Atmospheric pressure plasma enhanced spatial ALD of silver. United States. https://doi.org/10.1116/1.4902561
Bruele, Fieke J. van den,, Smets, Mireille, Illiberi, Andrea, Poodt, Paul, Creyghton, Yves, Buskens, Pascal, and Roozeboom, Fred. 2015. "Atmospheric pressure plasma enhanced spatial ALD of silver". United States. https://doi.org/10.1116/1.4902561.
@article{osti_22392104,
title = {Atmospheric pressure plasma enhanced spatial ALD of silver},
author = {Bruele, Fieke J. van den, and Smets, Mireille and Illiberi, Andrea and Poodt, Paul and Creyghton, Yves and Buskens, Pascal and Roozeboom, Fred},
abstractNote = {The authors have investigated the growth of thin silver films using a unique combination of atmospheric process elements: spatial atomic layer deposition and an atmospheric pressure surface dielectric barrier discharge plasma source. Silver films were grown on top of Si substrates with good purity as revealed by resistivity values as low as 18 μΩ cm and C- and F-levels below detection limits of energy dispersive x-ray analysis. The growth of the silver films starts through the nucleation of islands that subsequently coalesce. The authors show that the surface island morphology is dependent on surface diffusion, which can be controlled by temperature within the deposition temperature range of 100–120 °C.},
doi = {10.1116/1.4902561},
url = {https://www.osti.gov/biblio/22392104}, journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 1,
volume = 33,
place = {United States},
year = {Thu Jan 15 00:00:00 EST 2015},
month = {Thu Jan 15 00:00:00 EST 2015}
}