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Title: Infrared and thermoelectric power generation in thin atomic layer deposited Nb-doped TiO{sub 2} films

Abstract

Infrared radiation is used to radiatively transfer heat to a nanometric power generator (NPG) device with a thermoelectric Nb-doped TiO{sub 2} film deposited by atomic layer deposition (ALD) as the active element, onto a borosilicate glass substrate. The linear rise of the produced voltage with respect to the temperature difference between the “hot” and “cold” junctions, typical of the Seebeck effect, is missing. The discovery of the violation of the Seebeck effect in NPG devices combined with the ability of ALD to tune thermoelectric thin film properties could be exploited to increase the efficiency of these devices for energy harvesting purposes.

Authors:
; ; ;  [1]; ;  [2]
  1. Department of Physics and Astronomy, James Madison University, 901 Carrier Drive, Harrisonburg, Virginia 22807 (United States)
  2. Department of Chemistry, Aalto University, P.O. Box 16100, Aalto, 00076 Finland (Finland)
Publication Date:
OSTI Identifier:
22392097
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 33; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; BOROSILICATE GLASS; DEPOSITION; DEPOSITS; DOPED MATERIALS; EFFICIENCY; ELECTRIC POTENTIAL; HEAT; INFRARED RADIATION; LAYERS; NANOSTRUCTURES; RADIANT HEAT TRANSFER; SEEBECK EFFECT; THIN FILMS; TITANIUM OXIDES

Citation Formats

Mann, Harkirat S., Lang, Brian N., Schwab, Yosyp, Scarel, Giovanna, Niemelä, Janne-Petteri, and Karppinen, Maarit. Infrared and thermoelectric power generation in thin atomic layer deposited Nb-doped TiO{sub 2} films. United States: N. p., 2015. Web. doi:10.1116/1.4901457.
Mann, Harkirat S., Lang, Brian N., Schwab, Yosyp, Scarel, Giovanna, Niemelä, Janne-Petteri, & Karppinen, Maarit. Infrared and thermoelectric power generation in thin atomic layer deposited Nb-doped TiO{sub 2} films. United States. https://doi.org/10.1116/1.4901457
Mann, Harkirat S., Lang, Brian N., Schwab, Yosyp, Scarel, Giovanna, Niemelä, Janne-Petteri, and Karppinen, Maarit. 2015. "Infrared and thermoelectric power generation in thin atomic layer deposited Nb-doped TiO{sub 2} films". United States. https://doi.org/10.1116/1.4901457.
@article{osti_22392097,
title = {Infrared and thermoelectric power generation in thin atomic layer deposited Nb-doped TiO{sub 2} films},
author = {Mann, Harkirat S. and Lang, Brian N. and Schwab, Yosyp and Scarel, Giovanna and Niemelä, Janne-Petteri and Karppinen, Maarit},
abstractNote = {Infrared radiation is used to radiatively transfer heat to a nanometric power generator (NPG) device with a thermoelectric Nb-doped TiO{sub 2} film deposited by atomic layer deposition (ALD) as the active element, onto a borosilicate glass substrate. The linear rise of the produced voltage with respect to the temperature difference between the “hot” and “cold” junctions, typical of the Seebeck effect, is missing. The discovery of the violation of the Seebeck effect in NPG devices combined with the ability of ALD to tune thermoelectric thin film properties could be exploited to increase the efficiency of these devices for energy harvesting purposes.},
doi = {10.1116/1.4901457},
url = {https://www.osti.gov/biblio/22392097}, journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 1,
volume = 33,
place = {United States},
year = {Thu Jan 15 00:00:00 EST 2015},
month = {Thu Jan 15 00:00:00 EST 2015}
}