Fabrication of triangular nanobeam waveguide networks in bulk diamond using single-crystal silicon hard masks
- Department of Electrical Engineering and Computer Science and Research Laboratory of Electronics, Massachusetts Institute of Technology, 77 Massachusetts Ave., Building 36, Cambridge, Massachusetts 02139 (United States)
- Brookhaven National Laboratory, Center for Functional Nanomaterials, Upton, New York 11973 (United States)
- Department of Electrical Engineering and Microelectronics Research Center, Technion, Haifa 32000 (Israel)
- Department of Physics and Solid State Institute, Technion, Haifa 32000 (Israel)
A scalable approach for integrated photonic networks in single-crystal diamond using triangular etching of bulk samples is presented. We describe designs of high quality factor (Q = 2.51 × 10{sup 6}) photonic crystal cavities with low mode volume (V{sub m} = 1.062 × (λ/n){sup 3}), which are connected via waveguides supported by suspension structures with predicted transmission loss of only 0.05 dB. We demonstrate the fabrication of these structures using transferred single-crystal silicon hard masks and angular dry etching, yielding photonic crystal cavities in the visible spectrum with measured quality factors in excess of Q = 3 × 10{sup 3}.
- OSTI ID:
- 22392049
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 21; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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