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Title: Engineering 180° ferroelectric domains in epitaxial PbTiO{sub 3} thin films by varying the thickness of the underlying (La,Sr)MnO{sub 3} layer

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4897144· OSTI ID:22350810
 [1];  [2]
  1. Peter Grünberg Institute and Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons, Research Centre Jülich, D-52425 Jülich (Germany)
  2. Max Planck Institute for Solid State Research, Heisenbergstr. 1, D-70569 Stuttgart (Germany)

Epitaxial ferroelectric thin films of PbTiO{sub 3} (PTO) grown on top of nominally La{sub 0.7}Sr{sub 0.3}MnO{sub 3} (LSMO) submicron hillocks on Nb-doped SrTiO{sub 3} (100) substrate were investigated by means of scanning transmission electron microscopy. 180° ferroelectric domains were observed in the c-axis oriented PTO films. The formation and configuration of ferroelectric domains and domain walls were found to exhibit strong correlation with the thickness of the underlying LSMO hillocks. The domain walls start at the locations of the hillocks where the LSMO layer has a thickness of about 3 nm. Our results demonstrate that controlling the thickness variation (shape) of the LSMO hillocks can manipulate the position and density of the ferroelectric domain walls, which are considered to be the active elements for future nanoelectronics.

OSTI ID:
22350810
Journal Information:
Applied Physics Letters, Vol. 105, Issue 13; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English