Surface and sub-surface thermal oxidation of thin ruthenium films

Journal Article · Mon Sep 29 00:00:00 EDT 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4896993· OSTI ID:22350783

Coloma Ribera, R.; Yakshin, A. E.; Bijkerk, F. ^[1]; Kokke, S.; Zoethout, E. ^[2]

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1. MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede (Netherlands)
2. FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein (Netherlands)

A mixed 2D (film) and 3D (nano-column) growth of ruthenium oxide has been experimentally observed for thermally oxidized polycrystalline ruthenium thin films. Furthermore, in situ x-ray reflectivity upon annealing allowed the detection of 2D film growth as two separate layers consisting of low density and high density oxides. Nano-columns grow at the surface of the low density oxide layer, with the growth rate being limited by diffusion of ruthenium through the formed oxide film. Simultaneously, with the growth of the columns, sub-surface high density oxide continues to grow limited by diffusion of oxygen or ruthenium through the oxide film.

• OSTI ID: 22350783
• Journal Information: Applied Physics Letters, Vol. 105, Issue 13; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANNEALING
CRYSTAL GROWTH
DETECTION
DIFFUSION
HEAT TREATMENTS
LAYERS
OXIDATION
POLYCRYSTALS
REFLECTIVITY
RUTHENIUM
RUTHENIUM OXIDES
SURFACES
THIN FILMS
X RADIATION