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Title: Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO)

Abstract

Highlights: • We propose a method to fabricate non-gold Ohmic contact on low n-type GaAs with IGZO. • 0.15 A/cm{sup 2} on-current and 1.5 on/off-current ratio are achieved in the junction. • InAs and InGaAs formed by this process decrease an electron barrier height. • Traps generated by diffused O atoms also induce a trap-assisted tunneling phenomenon. - Abstract: Here, an excellent non-gold Ohmic contact on low n-type GaAs is demonstrated by using indium gallium zinc oxide and investigating through time of flight-secondary ion mass spectrometry, X-ray photoelectron spectroscopy, transmission electron microscopy, J–V measurement, and H [enthalpy], S [entropy], Cp [heat capacity] chemistry simulation. In is diffused through GaAs during annealing and reacts with As, forming InAs and InGaAs phases with lower energy bandgap. As a result, it decreases the electron barrier height, eventually increasing the reverse current. In addition, traps generated by diffused O atoms induce a trap-assisted tunneling phenomenon, increasing generation current and subsequently the reverse current. Therefore, an excellent Ohmic contact with 0.15 A/cm{sup 2} on-current density and 1.5 on/off-current ratio is achieved on n-type GaAs.

Authors:
 [1];  [2]; ; ;  [1];  [1]
  1. Samsung-SKKU Graphene Center and School of Electronics and Electrical Engineering, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)
  2. Department of Electrical Engineering, Stanford University, Stanford, CA 94305 (United States)
Publication Date:
OSTI Identifier:
22345230
Resource Type:
Journal Article
Journal Name:
Materials Research Bulletin
Additional Journal Information:
Journal Volume: 50; Other Information: Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0025-5408
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ANNEALING; ELECTRICAL PROPERTIES; ELECTRONS; ENTHALPY; ENTROPY; GALLIUM; GALLIUM ARSENIDES; GOLD; INDIUM; INDIUM ARSENIDES; MASS SPECTROSCOPY; SPECIFIC HEAT; TUNNEL EFFECT; X-RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDES

Citation Formats

Yang, Seong-Uk, Product and Test Engineering Team, System LSI Division, Samsung Electronics Co., Ltd, Yongin 446-711, Jung, Woo-Shik, Lee, In-Yeal, Jung, Hyun-Wook, Kim, Gil-Ho, and Park, Jin-Hong. Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO). United States: N. p., 2014. Web. doi:10.1016/J.MATERRESBULL.2013.11.005.
Yang, Seong-Uk, Product and Test Engineering Team, System LSI Division, Samsung Electronics Co., Ltd, Yongin 446-711, Jung, Woo-Shik, Lee, In-Yeal, Jung, Hyun-Wook, Kim, Gil-Ho, & Park, Jin-Hong. Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO). United States. https://doi.org/10.1016/J.MATERRESBULL.2013.11.005
Yang, Seong-Uk, Product and Test Engineering Team, System LSI Division, Samsung Electronics Co., Ltd, Yongin 446-711, Jung, Woo-Shik, Lee, In-Yeal, Jung, Hyun-Wook, Kim, Gil-Ho, and Park, Jin-Hong. 2014. "Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO)". United States. https://doi.org/10.1016/J.MATERRESBULL.2013.11.005.
@article{osti_22345230,
title = {Ohmic contact formation process on low n-type gallium arsenide (GaAs) using indium gallium zinc oxide (IGZO)},
author = {Yang, Seong-Uk and Product and Test Engineering Team, System LSI Division, Samsung Electronics Co., Ltd, Yongin 446-711 and Jung, Woo-Shik and Lee, In-Yeal and Jung, Hyun-Wook and Kim, Gil-Ho and Park, Jin-Hong},
abstractNote = {Highlights: • We propose a method to fabricate non-gold Ohmic contact on low n-type GaAs with IGZO. • 0.15 A/cm{sup 2} on-current and 1.5 on/off-current ratio are achieved in the junction. • InAs and InGaAs formed by this process decrease an electron barrier height. • Traps generated by diffused O atoms also induce a trap-assisted tunneling phenomenon. - Abstract: Here, an excellent non-gold Ohmic contact on low n-type GaAs is demonstrated by using indium gallium zinc oxide and investigating through time of flight-secondary ion mass spectrometry, X-ray photoelectron spectroscopy, transmission electron microscopy, J–V measurement, and H [enthalpy], S [entropy], Cp [heat capacity] chemistry simulation. In is diffused through GaAs during annealing and reacts with As, forming InAs and InGaAs phases with lower energy bandgap. As a result, it decreases the electron barrier height, eventually increasing the reverse current. In addition, traps generated by diffused O atoms induce a trap-assisted tunneling phenomenon, increasing generation current and subsequently the reverse current. Therefore, an excellent Ohmic contact with 0.15 A/cm{sup 2} on-current density and 1.5 on/off-current ratio is achieved on n-type GaAs.},
doi = {10.1016/J.MATERRESBULL.2013.11.005},
url = {https://www.osti.gov/biblio/22345230}, journal = {Materials Research Bulletin},
issn = {0025-5408},
number = ,
volume = 50,
place = {United States},
year = {Sat Feb 01 00:00:00 EST 2014},
month = {Sat Feb 01 00:00:00 EST 2014}
}