Time-dependent dielectric breakdown measurements of porous organosilicate glass using mercury and solid metal probes

Journal Article · Mon Sep 01 00:00:00 EDT 2014 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.4891563· OSTI ID:22318040

Pei, Dongfei; Nichols, Michael T.; King, Sean W.; Clarke, James S. ^[1]; Nishi, Yoshio ^[2]

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1. Intel Corporation, Hillsboro, Oregon 97124 (United States)
2. Department of Electrical Engineering, Stanford University, Stanford, California 94305 (United States)

Time-dependent dielectric breakdown (TDDB) is one of the major concerns for low-k dielectric materials. During plasma processing, low-k dielectrics are subjected to vacuum ultraviolet photon radiation and charged-particle bombardment. To examine the change of TDDB properties, time-to-breakdown measurements are made to porous SiCOH before and after plasma exposure. Significant discrepancies between mercury and solid-metal probes are observed and have been shown to be attributed to mercury diffusion into the dielectric porosities.

• OSTI ID: 22318040
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 32, Issue 5; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
BREAKDOWN
CHARGED PARTICLES
DIELECTRIC MATERIALS
MERCURY
ORGANIC SILICON COMPOUNDS
POROUS MATERIALS
ULTRAVIOLET RADIATION