The ReactorSTM: Atomically resolved scanning tunneling microscopy under high-pressure, high-temperature catalytic reaction conditions
Abstract
To enable atomic-scale observations of model catalysts under conditions approaching those used by the chemical industry, we have developed a second generation, high-pressure, high-temperature scanning tunneling microscope (STM): the ReactorSTM. It consists of a compact STM scanner, of which the tip extends into a 0.5 ml reactor flow-cell, that is housed in a ultra-high vacuum (UHV) system. The STM can be operated from UHV to 6 bars and from room temperature up to 600 K. A gas mixing and analysis system optimized for fast response times allows us to directly correlate the surface structure observed by STM with reactivity measurements from a mass spectrometer. The in situ STM experiments can be combined with ex situ UHV sample preparation and analysis techniques, including ion bombardment, thin film deposition, low-energy electron diffraction and x-ray photoelectron spectroscopy. The performance of the instrument is demonstrated by atomically resolved images of Au(111) and atom-row resolution on Pt(110), both under high-pressure and high-temperature conditions.
- Authors:
-
- Huygens-Kamerlingh Onnes Laboratory, Leiden University, P.O. box 9504, 2300 RA Leiden (Netherlands)
- Publication Date:
- OSTI Identifier:
- 22314660
- Resource Type:
- Journal Article
- Journal Name:
- Review of Scientific Instruments
- Additional Journal Information:
- Journal Volume: 85; Journal Issue: 8; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CATALYSTS; ELECTRON DIFFRACTION; GOLD; IMAGES; ION BEAMS; MASS SPECTROMETERS; PLATINUM; PRESSURE RANGE MEGA PA 10-100; PRESSURE RANGE MICRO PA; RESOLUTION; SAMPLE PREPARATION; SCANNING TUNNELING MICROSCOPY; SURFACE COATING; TEMPERATURE RANGE 0273-0400 K; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; X-RAY PHOTOELECTRON SPECTROSCOPY
Citation Formats
Herbschleb, C. T., Tuijn, P. C. van der, Roobol, S. B., Navarro, V., Bakker, J. W., Liu, Q., Stoltz, D., Cañas-Ventura, M. E., Verdoes, G., Spronsen, M. A. van, Bergman, M., Crama, L., Taminiau, I., Frenken, J. W. M.,, Ofitserov, A., and Baarle, G. J. C. van. The ReactorSTM: Atomically resolved scanning tunneling microscopy under high-pressure, high-temperature catalytic reaction conditions. United States: N. p., 2014.
Web. doi:10.1063/1.4891811.
Herbschleb, C. T., Tuijn, P. C. van der, Roobol, S. B., Navarro, V., Bakker, J. W., Liu, Q., Stoltz, D., Cañas-Ventura, M. E., Verdoes, G., Spronsen, M. A. van, Bergman, M., Crama, L., Taminiau, I., Frenken, J. W. M.,, Ofitserov, A., & Baarle, G. J. C. van. The ReactorSTM: Atomically resolved scanning tunneling microscopy under high-pressure, high-temperature catalytic reaction conditions. United States. https://doi.org/10.1063/1.4891811
Herbschleb, C. T., Tuijn, P. C. van der, Roobol, S. B., Navarro, V., Bakker, J. W., Liu, Q., Stoltz, D., Cañas-Ventura, M. E., Verdoes, G., Spronsen, M. A. van, Bergman, M., Crama, L., Taminiau, I., Frenken, J. W. M.,, Ofitserov, A., and Baarle, G. J. C. van. 2014.
"The ReactorSTM: Atomically resolved scanning tunneling microscopy under high-pressure, high-temperature catalytic reaction conditions". United States. https://doi.org/10.1063/1.4891811.
@article{osti_22314660,
title = {The ReactorSTM: Atomically resolved scanning tunneling microscopy under high-pressure, high-temperature catalytic reaction conditions},
author = {Herbschleb, C. T. and Tuijn, P. C. van der and Roobol, S. B. and Navarro, V. and Bakker, J. W. and Liu, Q. and Stoltz, D. and Cañas-Ventura, M. E. and Verdoes, G. and Spronsen, M. A. van and Bergman, M. and Crama, L. and Taminiau, I. and Frenken, J. W. M., and Ofitserov, A. and Baarle, G. J. C. van},
abstractNote = {To enable atomic-scale observations of model catalysts under conditions approaching those used by the chemical industry, we have developed a second generation, high-pressure, high-temperature scanning tunneling microscope (STM): the ReactorSTM. It consists of a compact STM scanner, of which the tip extends into a 0.5 ml reactor flow-cell, that is housed in a ultra-high vacuum (UHV) system. The STM can be operated from UHV to 6 bars and from room temperature up to 600 K. A gas mixing and analysis system optimized for fast response times allows us to directly correlate the surface structure observed by STM with reactivity measurements from a mass spectrometer. The in situ STM experiments can be combined with ex situ UHV sample preparation and analysis techniques, including ion bombardment, thin film deposition, low-energy electron diffraction and x-ray photoelectron spectroscopy. The performance of the instrument is demonstrated by atomically resolved images of Au(111) and atom-row resolution on Pt(110), both under high-pressure and high-temperature conditions.},
doi = {10.1063/1.4891811},
url = {https://www.osti.gov/biblio/22314660},
journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 8,
volume = 85,
place = {United States},
year = {Fri Aug 15 00:00:00 EDT 2014},
month = {Fri Aug 15 00:00:00 EDT 2014}
}