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Title: Effect of substrate temperature on the microstructural properties of titanium nitride nanowires grown by pulsed laser deposition

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4893298· OSTI ID:22314621
; ;  [1]; ;  [2]
  1. Department of Mechanical Engineering, North Carolina A and T State University, 1601 East Market St., Greensboro, North Carolina 27411 (United States)
  2. Department of Materials Science and Engineering, North Carolina State University, 911 Partners Way, EB1, Raleigh, North Carolina 27695 (United States)

The current work reports on the growth and microstructural characterization of titanium nitride (TiN) nanowires on single crystal silicon substrates using a pulsed laser deposition method. The physical and microstructural properties of the nanowires were characterized using field emission scanning electron microscopy (FESEM) and transmission electron microscopy (TEM). The corrosion properties of the TiN nanowires compared to TiN thin film were evaluated using Direct Current potentiodynamic and electrochemical impedance spectroscopy. The nanowires corroded faster than the TiN thin film, because the nanowires have a larger surface area which makes them more reactive in a corrosive environment. It was observed from the FESEM image analyses that as the substrate temperature increases from 600 °C to 800 °C, there was an increase in both diameter (25 nm–50 nm) and length (150 nm–250 nm) of the nanowire growth. There was also an increase in spatial density with an increase of substrate temperature. The TEM results showed that the TiN nanowires grow epitaxially with the silicon substrate via domain matching epitaxy paradigm, despite a large misfit.

OSTI ID:
22314621
Journal Information:
Journal of Applied Physics, Vol. 116, Issue 6; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English