Reflection high-energy electron diffraction beam-induced structural and property changes on WO{sub 3} thin films

Journal Article · Mon Aug 04 00:00:00 EDT 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4892810· OSTI ID:22314478

Varga, T. ^[1]; Zhang, K. H. L.; Chambers, S. A. ^[2]

---

1. Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland, Washington 99352 (United States)
2. Fundamental and Computational Sciences Directorate, Pacific Northwest National Laboratory, Richland, Washington 99352 (United States)

Reduction of transition metal oxides can greatly change their physical and chemical properties. Using deposition of WO{sub 3} as a case study, we demonstrate that reflection high-energy electron diffraction (RHEED), a surface-sensitive tool widely used to monitor thin-film deposition processes, can significantly affect the cation valence and physical properties of the films through electron-beam induced sample reduction. The RHEED beam is found to increase film smoothness during epitaxial growth of WO{sub 3}, as well as change the electronic properties of the film through preferential removal of surface oxygen.

• OSTI ID: 22314478
• Journal Information: Applied Physics Letters, Vol. 105, Issue 5; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CATIONS
ELECTRON BEAMS
ELECTRON DIFFRACTION
OXYGEN
REFLECTION
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN OXIDES