Spatial correlation between chemical and topological defects in vitreous silica: UV-resonance Raman study
Journal Article
·
· Journal of Chemical Physics
- Elettra-Sincrotrone Trieste, S. S. 14 Km 163.5, I-34149 Trieste (Italy)
A spatial correlation between chemical and topological defects in the tetrahedron network in vitreous silica produced by a fusion process of natural quartz crystals was found by synchrotron-based UV resonance Raman experiments. Furthermore, a quantitative correlation between these defects was obtained by comparing visible Raman and UV absorption spectra. These results indicate that in vitreous silica produced by the fusion process the topological defects disturb the surrounding tetrahedral silica network and induce further disorder regions with sub nanometric sizes.
- OSTI ID:
- 22311386
- Journal Information:
- Journal of Chemical Physics, Vol. 140, Issue 24; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-9606
- Country of Publication:
- United States
- Language:
- English
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