Investigation of ferroelectric domains in thin films of vinylidene fluoride oligomers
- Department of Physics and Astronomy, and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Nebraska 68588 (United States)
- Department of Electrical Engineering and Center for Nanohybrid Functional Materials, University of Nebraska-Lincoln, Nebraska 68588 (United States)
High-resolution vector piezoresponse force microscopy (PFM) has been used to investigate ferroelectric domains in thin vinylidene fluoride oligomer films fabricated by the Langmuir-Blodgett deposition technique. Molecular chains are found to be preferentially oriented normal to the substrate, and PFM imaging shows that the films are in ferroelectric β-phase with a predominantly in-plane polarization, in agreement with infrared spectroscopic ellipsometry and X-ray diffraction measurements. The fractal analysis of domain structure has yielded the Hausdorff dimension (D) in the range of ∼1.3–1.5 indicating a random-bond nature of the disorder potential, with domain size exhibiting Landau-Lifshitz-Kittel scaling.
- OSTI ID:
- 22311093
- Journal Information:
- Applied Physics Letters, Vol. 105, Issue 2; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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