Diffusion of oxygen in amorphous Al{sub 2}O{sub 3}, Ta{sub 2}O{sub 5}, and Nb{sub 2}O{sub 5}
- Department of Materials Science, Graduate School of Engineering, Osaka Prefecture University, Gakuen-cho 1-1, Naka-ku, Sakai 599-8531 (Japan)
- The Institute of Scientific and Industrial Research, Osaka University, Mihogaoka 8-1, Ibaraki, Osaka 567-0047 (Japan)
- Department of Materials Science and Engineering, Kyushu Institute of Technology, Tobata, Kitakyushu, Fukuoka 804-8550 (Japan)
- The Wakasa Wan Energy Research Center, Tsuruga, Fukui 914-0192 (Japan)
The self-diffusivity of oxygen in amorphous Al{sub 2}O{sub 3} (a-Al{sub 2}O{sub 3}), a-Ta{sub 2}O{sub 5}, and a-Nb{sub 2}O{sub 5} was investigated along with structural analysis in terms of pair distribution function (PDF). The low activation energy, ∼1.2 eV, for diffusion in the oxides suggests a single atomic jump of oxygen ions mediated via vacancy-like defects. However, the pre-exponential factor for a-Ta{sub 2}O{sub 5} and a-Nb{sub 2}O{sub 5} with lower bond energy was two orders of magnitude larger than that for a-Al{sub 2}O{sub 3} with higher bond energy. PDF analyses revealed that the short-range configuration in a-Ta{sub 2}O{sub 5} and a-Nb{sub 2}O{sub 5} was more broadly distributed than that in a-Al{sub 2}O{sub 3}. Due to the larger variety of atomic configurations of a-Ta{sub 2}O{sub 5} and a-Nb{sub 2}O{sub 5}, these oxides have a higher activation entropy for diffusion than a-Al{sub 2}O{sub 3}. The entropy term for diffusion associated with short-range structures was shown to be a dominant factor for diffusion in amorphous oxides.
- OSTI ID:
- 22308461
- Journal Information:
- Journal of Applied Physics, Vol. 116, Issue 3; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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