Vibrational spectra and structures of bare and Xe-tagged cationic Si{sub n}O{sub m}{sup +} clusters
- Institut für Optik und Atomare Physik, Technische Universität Berlin, Hardenbergstr. 36, 10623 Berlin (Germany)
- Institut für Physikalische Chemie, Georg-August-Universität Göttingen, Tammannstr. 6, 37077 Göttingen (Germany)
- Lehrstuhl für Theoretische Chemie, Technische Universität München, Lichtenbergstr. 4, 85747 Garching (Germany)
Vibrational spectra of Xe-tagged cationic silicon oxide clusters Si{sub n}O{sub m}{sup +} with n = 3–5 and m = n, n ± 1 in the gas phase are obtained by resonant infrared multiple photon dissociation (IRMPD) spectroscopy and density functional theory calculations. The Si{sub n}O{sub m}{sup +} clusters are produced in a laser vaporization ion source and Xe complexes are formed after thermalization to 100 K. The clusters are subsequently irradiated with tunable light from an IR free electron laser and changes in the mass distribution yield size-specific IR spectra. The measured IRMPD spectra are compared to calculated linear IR absorption spectra leading to structural assignments. For several clusters, Xe complexation alters the energetic order of the Si{sub n}O{sub m}{sup +} isomers. Common structural motifs include the Si{sub 2}O{sub 2} rhombus, the Si{sub 3}O{sub 2} pentagon, and the Si{sub 3}O{sub 3} hexagon.
- OSTI ID:
- 22308375
- Journal Information:
- Journal of Chemical Physics, Vol. 141, Issue 10; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-9606
- Country of Publication:
- United States
- Language:
- English
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