Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment

Suszka, A. K.; Berger, A.; Vavassori, P.; Obry, B.; Hillebrands, B.; Landeros, P.

doi:10.1063/1.4867001

Title: Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment

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Abstract

This work studies the influence of crystallographic alignment onto magnetization reversal in partially epitaxial Co films. A reproducible growth sequence was devised that allows for the continuous tuning of grain orientation disorder in Co films with uniaxial in-plane anisotropy by the controlled partial suppression of epitaxy. While all stable or meta-stable magnetization states occurring during a magnetic field cycle exhibit a uniform magnetization for fully epitaxial samples, non-uniform states appear for samples with sufficiently high grain orientation disorder. Simultaneously with the occurrence of stable domain states during the magnetization reversal, we observe a qualitative change of the applied field angle dependence of the coercive field. Upon increasing the grain orientation disorder, we observe a disappearance of transient domain wall propagation as the dominating reversal process, which is characterized by an increase of the coercive field for applied field angles away from the easy axis for well-ordered epitaxial samples. Upon reaching a certain disorder threshold level, we also find an anomalous magnetization reversal, which is characterized by a non-monotonic behavior of the remanent magnetization and coercive field as a function of the applied field angle in the vicinity of the nominal hard axis. This anomaly is a collective reversal mode thatmore »« less

Authors:

Suszka, A. K.; Berger, A. ^[1]; Vavassori, P. ^[1]; Obry, B.; Hillebrands, B. ^[2]; Landeros, P. ^[3]

CIC nanoGUNE Consolider, Tolosa Hiribidea 76, E-20018 Donostia-San Sebastian (Spain)
Fachbereich Physik and Landesforschungzentrum OPTIMAS, Technische Universität Kaiserslautern, Erwin-Schrödinger-Straße 56, D-67663 Kaiserslautern (Germany)
Departamento de Física, Universidad Técnica Federico Santa María, Avenida España 1680, 2390123 Valparaíso (Chile)

Publication Date:: Fri Feb 28 00:00:00 EST 2014

OSTI Identifier:: 22277969

Resource Type:: Journal Article

Journal Name:: Journal of Applied Physics

Additional Journal Information:: Journal Volume: 115; Journal Issue: 8; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979

Country of Publication:: United States

Language:: English

Subject:: 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ANISOTROPY; COBALT; COERCIVE FORCE; CRYSTAL GROWTH; CRYSTAL STRUCTURE; EPITAXY; GRAIN ORIENTATION; LIGHT SCATTERING; MAGNETIC FIELDS; MAGNETIZATION; MICROSCOPY; THIN FILMS; TRANSIENTS

Citation Formats


                    Idigoras, O., E-mail: o.idigoras@nanogune.eu, Suszka, A. K., Berger, A., Vavassori, P., IKERBASQUE, The Basque Foundation for Science, E-48011 Bilbao, Obry, B., Hillebrands, B., and Landeros, P. Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment.  United States: N. p., 2014. 
        Web.  doi:10.1063/1.4867001.

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                    Idigoras, O., E-mail: o.idigoras@nanogune.eu, Suszka, A. K., Berger, A., Vavassori, P., IKERBASQUE, The Basque Foundation for Science, E-48011 Bilbao, Obry, B., Hillebrands, B., & Landeros, P. Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment.  United States.  https://doi.org/10.1063/1.4867001

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                    Idigoras, O., E-mail: o.idigoras@nanogune.eu, Suszka, A. K., Berger, A., Vavassori, P., IKERBASQUE, The Basque Foundation for Science, E-48011 Bilbao, Obry, B., Hillebrands, B., and Landeros, P. 2014.  
        "Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment".  United States.  https://doi.org/10.1063/1.4867001.

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@article{osti_22277969,

  title        = {Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment},

  author       = {Idigoras, O., E-mail: o.idigoras@nanogune.eu and Suszka, A. K. and Berger, A. and Vavassori, P. and IKERBASQUE, The Basque Foundation for Science, E-48011 Bilbao and Obry, B. and Hillebrands, B. and Landeros, P.},

  abstractNote = {This work studies the influence of crystallographic alignment onto magnetization reversal in partially epitaxial Co films. A reproducible growth sequence was devised that allows for the continuous tuning of grain orientation disorder in Co films with uniaxial in-plane anisotropy by the controlled partial suppression of epitaxy. While all stable or meta-stable magnetization states occurring during a magnetic field cycle exhibit a uniform magnetization for fully epitaxial samples, non-uniform states appear for samples with sufficiently high grain orientation disorder. Simultaneously with the occurrence of stable domain states during the magnetization reversal, we observe a qualitative change of the applied field angle dependence of the coercive field. Upon increasing the grain orientation disorder, we observe a disappearance of transient domain wall propagation as the dominating reversal process, which is characterized by an increase of the coercive field for applied field angles away from the easy axis for well-ordered epitaxial samples. Upon reaching a certain disorder threshold level, we also find an anomalous magnetization reversal, which is characterized by a non-monotonic behavior of the remanent magnetization and coercive field as a function of the applied field angle in the vicinity of the nominal hard axis. This anomaly is a collective reversal mode that is caused by disorder-induced frustration and it can be qualitatively and even quantitatively explained by means of a two Stoner-Wohlfarth particle model. Its predictions are furthermore corroborated by Kerr microscopy and by Brillouin light scattering measurements.},

  doi          = {10.1063/1.4867001},

  url          = {https://www.osti.gov/biblio/22277969},
  journal      = {Journal of Applied Physics},

  issn         = {0021-8979},

  number       = 8,

  volume       = 115,

  place        = {United States},

  year         = {Fri Feb 28 00:00:00 EST 2014},

  month        = {Fri Feb 28 00:00:00 EST 2014}

}

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