skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Lateral carrier diffusion and current gain in terahertz InGaAs/InP double-heterojunction bipolar transistors

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4862405· OSTI ID:22275710
; ; ;  [1]
  1. Department of Electrical and Computer Engineering, University of California, Santa Barbara, California 93106 (United States)

The DC current gain in In{sub 0.53}Ga{sub 0.47}As/InP double-heterojunction bipolar transistors is computed based on a drift-diffusion model, and is compared with experimental data. Even in the absence of other scaling effects, lateral diffusion of electrons to the base Ohmic contacts causes a rapid reduction in DC current gain as the emitter junction width and emitter-base contact spacing are reduced. The simulation and experimental data are compared in order to examine the effect of carrier lateral diffusion on current gain. The impact on current gain due to device scaling and approaches to increase current gain are discussed.

OSTI ID:
22275710
Journal Information:
Journal of Applied Physics, Vol. 115, Issue 3; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English

Similar Records

High-speed, high-current-gain P-n-p InP/InGaAs heterojunction bipolar transistors
Journal Article · Fri Jan 01 00:00:00 EST 1993 · IEEE Electron Device Letters (Institute of Electrical and Electronics Engineers); (United States) · OSTI ID:22275710

Gain limitations of scaled InP/InGaAs heterojunction bipolar transistors
Journal Article · Fri Jun 01 00:00:00 EDT 2001 · Journal of Applied Physics · OSTI ID:22275710

Electron irradiation effects in polyimide passivated InP/InGaAs single heterojunction bipolar transistors
Journal Article · Wed Dec 01 00:00:00 EST 1999 · IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers) · OSTI ID:22275710