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Title: Enhancement of band-to-band tunneling in mono-layer transition metal dichalcogenides two-dimensional materials by vacancy defects

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4862667· OSTI ID:22275694
;  [1];  [2];  [3]; ;  [4];  [5]
  1. State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)
  2. School of Physics Science and Technology, Inner Mongolia University, Hohhot 010021 (China)
  3. Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, California 94720 (United States)
  4. Key Laboratory of Wide Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071 (China)
  5. Material Science Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720 (United States)

The band-to-band tunneling of monolayer transition metal dichalcogenides nano-junction is investigated using atomistic ab initio quantum transport simulations. From the simulation, it is found that the transition metal vacancy defect in the two-dimensional MX{sub 2} (M = Mo,W; X = S,Se) band-to-band tunneling diode can dramatically boost the on-state current up to 10 times while maintaining the device sub-threshold swing. The performance enhancement mechanism is discussed in detail by examining partial density of states of the system. It is found that the transition metal vacancy induces band-gap states, which reduce the effective length of the tunneling transition region.

OSTI ID:
22275694
Journal Information:
Applied Physics Letters, Vol. 104, Issue 2; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English