Hybrid model of atmospheric pressure Ar/O{sub 2}/TiCl{sub 4} radio-frequency capacitive discharge for TiO{sub 2} deposition
- ENS Cachan, UPMC, Paris (France)
- College of Science, Donghua University, Shanghai 201620 (China)
- College of Materials Science and Engineering, Donghua University, Shanghai 201620 (China)
A hybrid global-analytical model of an atmospheric pressure radio-frequency driven capacitive discharge is applied to determine the plasma conditions for TiO{sub 2} film deposition. The feed gas is mainly argon with a small fraction of O{sub 2} and a smaller fraction of TiCl{sub 4}. Variations of the discharge parameters and species densities with O{sub 2} concentration, discharge power, and flow rate are determined. A simplified chemistry model is developed and compared with the simulation results, showing good agreement. For a base case with Ar/O{sub 2}/TiCl{sub 4} flow rates of 203/30/0.17 sccm, the results indicate that a minimum O{sub 2} fraction of 7.3 × 10{sup −4} is required for pure (un-chlorinated) TiO{sub 2} film deposition that the active precursor species is TiO{sub 2}Cl{sub 3}, with subsequent abstraction of Cl atoms by dissociative electron attachment and that the deposition rates are around 1 nm/s.
- OSTI ID:
- 22275561
- Journal Information:
- Journal of Applied Physics, Vol. 115, Issue 18; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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