Structural and magnetic etch damage in CoFeB

Journal Article · Wed May 07 00:00:00 EDT 2014 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4869276· OSTI ID:22273710

Krayer, L. ^[1]; Lau, J. W. ^[2]

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1. Physics Department, University of California, San Diego, California 92093 (United States)
2. Materials Science and Engineering Division, NIST, Gaithersburg, Maryland 20899 (United States)

A detailed understanding of the interfacial properties of thin films used in magnetic media is critical for the aggressive component scaling required for continued improvement in storage density. In particular, it is important to understand how common etching and milling processes affect the interfacial magnetism. We have used polarized neutron reflectometry and transmission electron microscopy to characterize the structural and magnetic properties of an ion beam etched interface of a CoFeB film. We found that the etching process results in a sharp magnetic interface buried under a nanometer scale layer of non-magnetic, compositionally distinct material.

• OSTI ID: 22273710
• Journal Information: Journal of Applied Physics, Vol. 115, Issue 17; Conference: 55. annual conference on magnetism and magnetic materials, Atlanta, GA (United States), 14-18 Nov 2010; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
COBALT COMPOUNDS
DAMAGE
ETCHING
INTERFACES
IRON BORIDES
MAGNETIC PROPERTIES
MAGNETISM
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY