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Title: Investigation of ionized metal flux in enhanced high power impulse magnetron sputtering discharges

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4871635· OSTI ID:22273564
 [1]; ;  [2]; ;  [3];  [4]
  1. Faculty of Science, University of South Bohemia, Branisovska 31, 37005 Ceske Budejovice (Czech Republic)
  2. Institute of Physics v. v. i., Academy of Science of the Czech Republic, Na Slovance 2, 182 21 Prague (Czech Republic)
  3. Institut für Physik, Ernst-Moritz-Arndt-Universität Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald (Germany)
  4. Faculty of Mathematics and Physics, Charles University in Prague, V Holesovickach 2, 180 00 Prague (Czech Republic)

The metal ionized flux fraction and production of double charged metal ions Me{sup 2+} of different materials (Al, Cu, Fe, Ti) by High Power Impulse Magnetron Sputtering (HiPIMS) operated with and without a pre-ionization assistance is compared in the paper. The Electron Cyclotron Wave Resonance (ECWR) discharge was employed as the pre-ionization agent providing a seed of charge in the idle time of HiPIMS pulses. A modified grid-free biased quartz crystal microbalance was used to estimate the metal ionized flux fraction ξ. The energy-resolved mass spectrometry served as a complementary method to distinguish particular ion contributions to the total ionized flux onto the substrate. The ratio between densities of doubly Me{sup 2+} and singly Me{sup +} charged metal ions was determined. It is shown that ECWR assistance enhances Me{sup 2+} production with respect of absorbed rf-power. The ECWR discharge also increases the metal ionized flux fraction of about 30% especially in the region of lower pressures. Further, the suppression of the gas rarefaction effect due to enhanced secondary electron emission of Me{sup 2+} was observed.

OSTI ID:
22273564
Journal Information:
Journal of Applied Physics, Vol. 115, Issue 15; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English