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Title: Magnetically induced enhancement of reversibly responding conductometric sensors

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4874183· OSTI ID:22273495
; ;  [1];  [1]
  1. School of Physics, Georgia Institute of Technology, Atlanta, Georgia 30332 (United States)

Small magnetic fields are found to greatly enhance the reversible room temperature conductometric responses of n and p- type porous silicon (PS) interfaces, treated with nanostructured island sites containing paramagnetic Co(II) and Fe(II). At concentrations sufficiently low so as to avoid cross talk between the nanostructured island sites, the response to NO concentrations demonstrates the significant effect which the Co(II) and Fe(II) have on the decorated extrinsic semiconductor majority charge carriers as they direct a dominant electron transduction process for reversible electron transduction and chemical sensing (Inverse Hard and Soft acid/base principle) in the absence of significant chemical bond formation. Co(II) and Fe(II) oxide sites enhance response and provide a means for small magnetic fields to interact with and enhance the sensor interface response. For p-type systems, the interaction is with small virtually constant thermal electron populations lying above the Fermi energy at 0 K. The electron removal rate increases with magnetic field strength. At the highest magnetic fields and NO analyte concentrations the available electron population is depleted, and the response to the analyte decreases at higher concentrations. At lower magnetic fields (<1000 G), the response faithfully follows concentration. For n-type systems, the magnetic field interaction increases resistance. This increase in response may be attributed to the interaction with donor levels ∼0.025 eV below the conduction band. A substantial enhancement of sensor response relative to that for the Co(II) and Fe(II) treated PS interfaces is observed, with the introduction of a small magnetic field greatly increasing an already enhanced conductometric response.

OSTI ID:
22273495
Journal Information:
Journal of Applied Physics, Vol. 115, Issue 16; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English