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Title: Investigating the impact of source/drain doping dependent effective masses on the transport characteristics of ballistic Si-nanowire field-effect-transistors

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4869495· OSTI ID:22271162
 [1];  [2]
  1. Centre for Research in Nanoscience and Nanotechnology (CRNN), University of Calcutta, Kolkata (India)
  2. Department of Electronic Science, University of Calcutta, Kolkata (India)

This article studies the impact of doping dependent carrier effective masses of the source/drain regions on transport properties of Si-nanowire field effect transistors within ballistic limit. The difference of carrier effective mass in channel and that in the source/drain regions leads to a misalignment of respective sub-bands and forms non-ideal contacts. Such non-idealities are incorporated by modifying the relevant self-energies which control the effective electronic transport from source to drain through the channel. Non-ideality also arises in the nature of local density of states in the channel due to sub-band misalignment, resulting to a reduction of drain current by almost 50%. The highest values of drain current, leakage current, and their ratio are obtained for the S/D doping concentrations of 3 × 10{sup 20} cm{sup −3}, 8 × 10{sup 20} cm{sup −3}, and 2 × 10{sup 20} cm{sup −3}, respectively, for the nanowire of length 10 nm and diameter of 3 nm. Interestingly, the maximum of sub-threshold swing, minimum of threshold voltage, and the maximum of leakage current are observed to be apparent at the same doping concentration.

OSTI ID:
22271162
Journal Information:
Journal of Applied Physics, Vol. 115, Issue 12; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English