skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Screening effects in ferroelectric resistive switching of BiFeO{sub 3} thin films

Journal Article · · APL Materials
DOI:https://doi.org/10.1063/1.4875355· OSTI ID:22269165
;  [1]
  1. Zernike Institute for Advanced Materials, University of Groningen, 9747 AG Groningen (Netherlands)

We investigate ferroelectric resistive switching in BiFeO{sub 3} thin films by performing local conductivity measurements. By comparing conduction characteristics at artificially up-polarized domains with those at as-grown down-polarized domains, the change in resistance is attributed to the modification of the electronic barrier height at the interface with the electrodes, upon the reversal of the electrical polarization. We also study the effect of oxygen vacancies on the observed conduction and we propose the existence of a different screening mechanism for up and down polarized domains.

OSTI ID:
22269165
Journal Information:
APL Materials, Vol. 2, Issue 5; Other Information: (c) 2014 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2166-532X
Country of Publication:
United States
Language:
English

Similar Records

Ferroelectric Self-Poling, Switching, and Monoclinic Domain Configuration in BiFeO 3 Thin Films
Journal Article · Mon May 23 00:00:00 EDT 2016 · Advanced Functional Materials · OSTI ID:22269165

Hierarchical Domain Structure and Extremely Large Wall Current in Epitaxial BiFeO 3 Thin Films
Journal Article · Wed Jun 06 00:00:00 EDT 2018 · Advanced Functional Materials · OSTI ID:22269165

ZnO as a buffer layer for growth of BiFeO{sub 3} thin films
Journal Article · Sun Aug 15 00:00:00 EDT 2010 · Journal of Applied Physics · OSTI ID:22269165