skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Fundamental optical properties of InN grown by epitaxial lateral overgrowth method

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4848308· OSTI ID:22261750
; ; ; ; ; ;  [1]
  1. Department of Engineering and Applied Science, Sophia University, 7-1 Kioi-cho, Chiyoda-ku, Tokyo 102-8554 (Japan)

Optical properties of InN grown by the epitaxial lateral overgrowth (ELO) method have been studied using photoluminescence (PL) and excitation-correlation (EC) measurements. The PL spectrum is analyzed by free-electron recombination band (FERB) model, which shows that the ELO sample has a very low background carrier concentration (n=5.5*10{sup 16}[cm{sup −3]}). EC measurements show that the dependences of the band gap renormalization and Auger effect on the carrier concentrations are similar in spite of the different physical origins.

OSTI ID:
22261750
Journal Information:
AIP Conference Proceedings, Vol. 1566, Issue 1; Conference: ICPS 2012: 31. international conference on the physics of semiconductors, Zurich (Switzerland), 29 Jul - 3 Aug 2012; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English

Similar Records

Growth of very large InN microcrystals by molecular beam epitaxy using epitaxial lateral overgrowth
Journal Article · Sat Feb 28 00:00:00 EST 2015 · Journal of Applied Physics · OSTI ID:22261750

Characterization of high quality InN grown on production-style plasma assisted molecular beam epitaxy system
Journal Article · Thu May 15 00:00:00 EDT 2008 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:22261750

Coalescence of GaAs on (001) Si nano-trenches based on three-stage epitaxial lateral overgrowth
Journal Article · Mon May 18 00:00:00 EDT 2015 · Applied Physics Letters · OSTI ID:22261750