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Title: Synthesis and deposition of metal nanoparticles by gas condensation process

Journal Article · · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.4859260· OSTI ID:22258652
; ;  [1]; ;  [2];  [3]
  1. Fraunhofer Institut für Elektronenstrahl und Plasmatechnik, FEP, Winterbergstraße 28, 01277 Dresden (Germany)
  2. Institut für Festkörperelektronik, IFE, TU Dresden, Helmholtz Straße 18, 01069 Dresden (Germany)
  3. Fraunhofer Institut für Elektronenstrahl und Plasmatechnik, FEP, Winterbergstraße 28, 01277 Dresden, Germany and Institut für Festkörperelektronik, IFE, TU Dresden, Helmholtz Straße 18, 01069 Dresden (Germany)

In this work, the synthesis of Pt and Ag nanoparticles by means of the inert gas phase condensation of sputtered atomic vapor is presented. The process parameters (power, sputtering time, and gas flow) were varied in order to study the relationship between deposition conditions and properties of the nanoparticles such as their quantity, size, and size distribution. Moreover, the gas phase condensation process can be combined with a plasma enhanced chemical vapor deposition procedure in order to deposit nanocomposite coatings consisting of metallic nanoparticles embedded in a thin film matrix material. Selected examples of application of the generated nanoparticles and nanocomposites are discussed.

OSTI ID:
22258652
Journal Information:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 32, Issue 2; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
Country of Publication:
United States
Language:
English