An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources

Journal Article · Thu May 15 00:00:00 EDT 2014 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4872381· OSTI ID:22254895

Hartung, U.; Kopte, T. ^[1]; Zschornack, G. ^[2]; Kreller, M.; Silze, A. ^[3]

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1. Fraunhofer Institute for Electron Beam and Plasma Technology, 01277 Dresden (Germany)
2. Institute of Solid State Physics, Dresden University of Technology, 01062 Dresden, Germany and Helmholtz-Zentrum Dresden-Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, Dresden (Germany)
3. DREEBIT GmbH, 01900 Grossroehrsdorf (Germany)

An inverted cylindrical sputter magnetron device has been developed. The magnetron is acting as a metal vapor supply for an electron cyclotron resonance (ECR) ion source. FEM simulation of magnetic flux density was used to ensure that there is no critical interaction between both magnetic fields of magnetron and ECR ion source. Spatially resolved double Langmuir probe and optical emission spectroscopy measurements show an increase in electron density by one order of magnitude from 1 × 10{sup 10} cm{sup −3} to 1 × 10{sup 11} cm{sup −3}, when the magnetron plasma is exposed to the magnetic mirror field of the ECR ion source. Electron density enhancement is also indicated by magnetron plasma emission photography with a CCD camera. Furthermore, photographs visualize the formation of a localized loss-cone - area, when the magnetron is operated at magnetic mirror field conditions. The inverted cylindrical magnetron supplies a metal atom load rate of R > 1 × 10{sup 18} atoms/s for aluminum, which meets the demand for the production of a milliampere Al{sup +} ion beam.

• OSTI ID: 22254895
• Journal Information: Review of Scientific Instruments, Vol. 85, Issue 5; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
ALUMINIUM IONS
CAMERAS
CHARGE-COUPLED DEVICES
CYLINDRICAL CONFIGURATION
ECR ION SOURCES
ELECTRON CYCLOTRON-RESONANCE
ELECTRON DENSITY
EMISSION
EMISSION SPECTROSCOPY
FLUX DENSITY
ION BEAMS
LANGMUIR PROBE
MAGNETIC FIELDS
MAGNETIC FLUX
MAGNETIC MIRRORS
MAGNETRONS
PHOTOGRAPHY
PLASMA
VAPORS