Multilayer mirror with enhanced spectral selectivity for the next generation extreme ultraviolet lithography

Journal Article · Mon Nov 25 00:00:00 EST 2013 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4837335· OSTI ID:22253944

Yakshin, A. E. ^[1]; Novikova, N. N.; Krivtsun, V. M. ^[2]; Louis, E.; Bijkerk, F. ^[1]; Yakunin, A. M. ^[3]

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1. FOM Dutch Institute for Fundamental Energy Research (DIFFER), P.O. Box 1207, 3430 BE Nieuwegein (Netherlands)
2. Institute for Spectroscopy RAS, Fizicheskaya str. 5, Troitsk, Moscow 142190 (Russian Federation)
3. ASML, De Run 6501, 5504 DR Veldhoven (Netherlands)

We have demonstrated a hybrid extreme ultraviolet (EUV) multilayer mirror for 6.x nm radiation that provides selective suppression for infrared (IR) radiation. The mirror consists of an IR-transparent LaN∕B multilayer stack which is used as EUV-reflective coating and antireflective (AR) coating to suppress IR. The AR coating can be optimized to suppress CO{sub 2} laser radiation at the wavelength of 10.6 μm, which is of interest for application in next-generation EUV lithography systems.

• OSTI ID: 22253944
• Journal Information: Applied Physics Letters, Vol. 103, Issue 22; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CARBON DIOXIDE LASERS
EXTREME ULTRAVIOLET RADIATION
INFRARED RADIATION
LANTHANUM NITRIDES
LAYERS
LOCAL AREA NETWORKS
MIRRORS