Controlling precise magnetic field configuration around electron cyclotron resonance zone for enhancing plasma parameters and beam current
- Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871 (Japan)
Multi-charged ion source which has wide operating conditions is required in various application fields. We have constructed tandem type ECR ion source (ECRIS); one of the features of its main stage is an additional coil for controlling magnetic field distribution around the mirror bottom precisely. Here the effect of magnetic field variation caused by the additional coil is experimentally considered in terms of plasma parameters and beam current as the first investigation of the main stage plasma. Furthermore, behavior of magnetic lines of force flowing from the ECR zone is calculated, and is compared with measurement results aiming for better understanding of interrelationship between plasma production and ion beam generation on the ECRIS.
- OSTI ID:
- 22253743
- Journal Information:
- Review of Scientific Instruments, Vol. 85, Issue 2; Conference: ICIS 2011: 14. international conference on ion sources, Giardini-Naxos, Sicily (Italy), 12-16 Sep 2011; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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