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Title: Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF{sub 4} and O{sub 2}

Abstract

In this study, we have proposed a low-pressure reactive ion etching of bulk polymer materials with a gas mixture of CF{sub 4} and O{sub 2}, and have achieved precise fabrication of poly(methyl methacrylate) (PMMA) and perfluoroalkoxy (PFA) bulk polymer plates with high-aspect-ratio and narrow gap array structures, such as, pillar, frustum, or cone, on a nano/micro scale. The effects of the etching conditions on the shape and size of each pillar were evaluated by changing etching duration and the size/material of etching mask. The fabricated PMMA array structures indicate possibilities of optical waveguide and nanofiber array. PFA cone array structures showed super-hydrophobicity without any chemical treatments. Also, polystyrene-coated silica spheres were used as an etching mask for the pillar array structure formation to control the gap between pillars.

Authors:
 [1]; ;  [1];  [2];  [3];  [2];  [4]
  1. Department of Applied Chemistry and Biotechnology, Graduate School of Engineering, Chiba University, Chiba, 263-8522 (Japan)
  2. Tateyama Machine Co. Ltd., Toyama, 930-1305 (Japan)
  3. Tateyama Kagaku Industry Co. Ltd., Toyama, 930-1305 (Japan)
  4. Department of Mechanical and Production Engineering, Graduate School of Science and Technology, Niigata University, Niigata, 950-2181 (Japan)
Publication Date:
OSTI Identifier:
22251948
Resource Type:
Journal Article
Journal Name:
AIP Advances
Additional Journal Information:
Journal Volume: 3; Journal Issue: 11; Other Information: (c) 2013 Author(s); Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 2158-3226
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CARBON TETRAFLUORIDE; ETCHING; METHACRYLIC ACID ESTERS; MIXTURES; PLASMA; PMMA; POLYSTYRENE; SILICA

Citation Formats

Nabesawa, Hirofumi, Central Research Institute, Toyama Industrial Technology Center, Takaoka, 933-0981, Hiruma, Takaharu, Seki, Minoru, Hitobo, Takeshi, Wakabayashi, Suguru, Asaji, Toyohisa, Electronic-Mechanical Engineering Department, Oshima National College of Maritime Technology, Suo-Oshima, 742-2193, and Abe, Takashi. Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF{sub 4} and O{sub 2}. United States: N. p., 2013. Web. doi:10.1063/1.4830277.
Nabesawa, Hirofumi, Central Research Institute, Toyama Industrial Technology Center, Takaoka, 933-0981, Hiruma, Takaharu, Seki, Minoru, Hitobo, Takeshi, Wakabayashi, Suguru, Asaji, Toyohisa, Electronic-Mechanical Engineering Department, Oshima National College of Maritime Technology, Suo-Oshima, 742-2193, & Abe, Takashi. Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF{sub 4} and O{sub 2}. United States. https://doi.org/10.1063/1.4830277
Nabesawa, Hirofumi, Central Research Institute, Toyama Industrial Technology Center, Takaoka, 933-0981, Hiruma, Takaharu, Seki, Minoru, Hitobo, Takeshi, Wakabayashi, Suguru, Asaji, Toyohisa, Electronic-Mechanical Engineering Department, Oshima National College of Maritime Technology, Suo-Oshima, 742-2193, and Abe, Takashi. 2013. "Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF{sub 4} and O{sub 2}". United States. https://doi.org/10.1063/1.4830277.
@article{osti_22251948,
title = {Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF{sub 4} and O{sub 2}},
author = {Nabesawa, Hirofumi and Central Research Institute, Toyama Industrial Technology Center, Takaoka, 933-0981 and Hiruma, Takaharu and Seki, Minoru and Hitobo, Takeshi and Wakabayashi, Suguru and Asaji, Toyohisa and Electronic-Mechanical Engineering Department, Oshima National College of Maritime Technology, Suo-Oshima, 742-2193 and Abe, Takashi},
abstractNote = {In this study, we have proposed a low-pressure reactive ion etching of bulk polymer materials with a gas mixture of CF{sub 4} and O{sub 2}, and have achieved precise fabrication of poly(methyl methacrylate) (PMMA) and perfluoroalkoxy (PFA) bulk polymer plates with high-aspect-ratio and narrow gap array structures, such as, pillar, frustum, or cone, on a nano/micro scale. The effects of the etching conditions on the shape and size of each pillar were evaluated by changing etching duration and the size/material of etching mask. The fabricated PMMA array structures indicate possibilities of optical waveguide and nanofiber array. PFA cone array structures showed super-hydrophobicity without any chemical treatments. Also, polystyrene-coated silica spheres were used as an etching mask for the pillar array structure formation to control the gap between pillars.},
doi = {10.1063/1.4830277},
url = {https://www.osti.gov/biblio/22251948}, journal = {AIP Advances},
issn = {2158-3226},
number = 11,
volume = 3,
place = {United States},
year = {Fri Nov 15 00:00:00 EST 2013},
month = {Fri Nov 15 00:00:00 EST 2013}
}