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Title: Dielectric property of NiTiO{sub 3} doped substituted ortho-chloropolyaniline composites

Journal Article · · AIP Advances
DOI:https://doi.org/10.1063/1.4832223· OSTI ID:22251423
;  [1];  [2];  [1];  [3];  [4]
  1. Department of Physics, PES Institute of Technology, BSC, Bangalore- 560100 (India)
  2. Department of Materials Science, Gulbarga University, Gulbarga-585106, Karnataka (India)
  3. Department of Physics, Veerashaiva College, Bellary - 583 104, Karnataka (India)
  4. Department of Chemistry, PES Institute of Technology, BSC, Bangalore - 560100 (India)

Ortho-chloropolyaniline (OCP)-NiTiO{sub 3} composites have been synthesized via in-situ polymerization of ortho-chloroaniline with various weight percentages of NiTiO{sub 3.} Fourier Transform Infrared spectroscopic studies of Ortho-chloropolyaniline and its composites indicated the formation of composites as a result of Vander Waal's interaction between OCP and NiTiO{sub 3} particles. Surface morphology of OCP and OCP-NiTiO{sub 3} composites were studied using Scanning Electron Microscope (SEM). The SEM micrographs indicated a modified morphology after the composite formation. Dielectric properties and electric modulus of OCP and OCP-NiTiO{sub 3} composites have been investigated in the frequency range of 50 Hz – 5 MHz. It has been noticed that electrical resistance decreases with increase in weight percentage of NiTiO{sub 3} particles in polymer matrix as well as with applied frequency. The display of semicircular arcs in Cole-Cole plots indicates the formation of series resistor and capacitor in network causing a decrease in the relaxation time and as a result conductivity enhances in these composites. The facile and cost effective synthesis process and excellent dielectric and conductivity response of these materials makes them promising materials for practical applications.

OSTI ID:
22251423
Journal Information:
AIP Advances, Vol. 3, Issue 11; Other Information: (c) 2013 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2158-3226
Country of Publication:
United States
Language:
English