The formation of double-row oxide stripes during the initial oxidation of NiAl(100)

Journal Article · Wed Aug 28 00:00:00 EDT 2013 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4819759· OSTI ID:22218095

Qin, Hailang; Zhou, Guangwen ^[1]

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1. Department of Mechanical Engineering and Multidisciplinary Program in Materials Science and Engineering, State University of New York, Binghamton, New York 13902 (United States)

The initial growth of ultrathin aluminum oxide film during the oxidation of NiAl(100) was studied with scanning tunneling microscopy. Our observations reveal that the oxide film grows initially as pairs of a double-row stripe structure with a lateral size equal to the unit cell of θ-Al{sub 2}O{sub 3}. These double-row stripes serve as the very basic stable building units of the ordered oxide phase for growing thicker bulk-oxide-like thin films. It is shown that the electronic properties of these ultrathin double-row stripes do not differ significantly from that of the clean NiAl surface; however, the thicker oxide stripes show a decreased conductivity.

• OSTI ID: 22218095
• Journal Information: Journal of Applied Physics, Vol. 114, Issue 8; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALUMINIUM ALLOYS
ALUMINIUM OXIDES
ELECTRIC CONDUCTIVITY
NICKEL ALLOYS
OXIDATION
SCANNING TUNNELING MICROSCOPY
SURFACES
THIN FILMS