Epitaxial films of Heusler compound Co{sub 2}FeAl{sub 0.5}Si{sub 0.5} with high crystalline quality grown by off-axis sputtering

Journal Article · Mon Oct 14 00:00:00 EDT 2013 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4825338· OSTI ID:22217908

Peters, B.; Hageman, Stephen J.; Yang, F. Y. ^[1]; Alfonsov, A.; Blum, C. G. F. ^[2]; Woodward, P. M. ^[3]; Wurmehl, S.; Büchner, B. ^[2]

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1. Department of Physics, The Ohio State University, Columbus, Ohio 43210 (United States)
2. Leibniz Institute for Solid State and Materials Research Dresden, IFW, D-01171 Dresden (Germany)
3. Department of Chemistry and Biochemistry, The Ohio State University, Columbus, Ohio 43210 (United States)

Co{sub 2}FeAl{sub 0.5}Si{sub 0.5} films with a surface roughness of 0.12 nm have been grown epitaxially on lattice-matched MgAl{sub 2}O{sub 4} (001) substrates by off-axis sputtering. X-ray diffraction shows pronounced Laue oscillations, rocking curves as narrow as 0.0043°, and clear Co{sub 2}FeAl{sub 0.5}Si{sub 0.5} (111) peaks indicating L2{sub 1} ordering. Magnetic characterizations show a clear magnetocrystalline anisotropy comprising cubic and epitaxy-induced uniaxial terms. Nuclear magnetic resonance measurements reveal L2{sub 1} order of 81% in the Co{sub 2}FeAl{sub 0.5}Si{sub 0.5} films. Magnetotransport measurements show a distinct separation of anisotropic magnetoresistance and ordinary magnetoresistance. These results demonstrate the state-of-the-art crystalline quality and magnetic uniformity of the Co{sub 2}FeAl{sub 0.5}Si{sub 0.5} films.

• OSTI ID: 22217908
• Journal Information: Applied Physics Letters, Vol. 103, Issue 16; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM ALLOYS
ANISOTROPY
COBALT ALLOYS
DEPOSITION
EPITAXY
FILMS
IRON ALLOYS
MAGNETORESISTANCE
NEUTRON DIFFRACTION
NUCLEAR MAGNETIC RESONANCE
OSCILLATIONS
PEAKS
ROUGHNESS
SPUTTERING
SUBSTRATES
SURFACES
X-RAY DIFFRACTION